Skip to main content

Feature Selection Techniques for Improving Rare Class Classification in Semiconductor Manufacturing Process

  • Conference paper
  • First Online:
Big Data Technologies and Applications (BDTA 2016)

Abstract

In order to enhance the performance, rare class prediction are to need the feature selection method for target class-related feature. Traditional data mining algorithms fail to predict rare class, as the class imbalanced data models are inherently built in favor of the majority of class-common characteristics among data instances. In the present paper, we propose the Euclidean distance- and standard deviation-based feature selection and over-sampling for the fault detection prediction model. We study applying the semiconductor manufacturing process control in fault detection prediction. First, the features calculate the MAV (Mean Absolute Value) median values. Secondly, the MeanEuSTDEV (the mean of Euclidean distance and standard deviation) are used to select the most appropriate features of the classification model. Third, to address the rare class over-fitting problem, oversampling is used. Finally, learning generates the fault detection prediction data-mining model. Furthermore, the prediction model is applied to measure the performance.

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Chapter
USD 29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD 44.99
Price excludes VAT (USA)
  • Available as EPUB and PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
USD 60.00
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

References

  1. Chomboon, K., Kerdprasop, K., Kerdprasop, N.: Rare class discovery techniques for highly imbalance data. In Proceeding International Multi Conference of Engineers and Computer Scientists, vol. 1 (2013)

    Google Scholar 

  2. May, G.S., Spanos, C.J.: Fundamentals of Semiconductor Manufacturing and Process Control. Wiley, New York (2006)

    Book  Google Scholar 

  3. Purnomo, M.R.A., Dewi, I.H.S.: A manufacturing quality assessment model based-on two stages interval type-2 fuzzy logic. In: IOP Conference Series: Materials Science and Engineering, vol. 105, no. 1, pp. 012044. IOP Publishing (2016)

    Google Scholar 

  4. Arif, F., Suryana, N., Hussin, B.: Cascade quality prediction method using multiple PCA+ID3 for multi-stage manufacturing system. IERI Procedia 4, 201–207 (2013)

    Article  Google Scholar 

  5. SEmi COnductor Manufacturing (2010). http://www.causality.inf.ethz.ch/repository.php

  6. Phinyomark, A., Hirunviriya, S., Limsakul, C., Phukpattaranont, P.: Evaluation of EMG feature extraction for hand movement recognition based on Euclidean distance and standard deviation. In: International Conference on IEEE (ECTI-CON), pp. 856–860 (2010)

    Google Scholar 

Download references

Acknowledgement

This work was funded by the Ministry of Science, ICT and Future Planning (NRF-2015R1C1A2A01051452).

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to Young Shin Han .

Editor information

Editors and Affiliations

Rights and permissions

Reprints and permissions

Copyright information

© 2017 ICST Institute for Computer Sciences, Social Informatics and Telecommunications Engineering

About this paper

Cite this paper

Kim, J.K., Cho, K.C., Lee, J.S., Han, Y.S. (2017). Feature Selection Techniques for Improving Rare Class Classification in Semiconductor Manufacturing Process. In: Jung, J., Kim, P. (eds) Big Data Technologies and Applications. BDTA 2016. Lecture Notes of the Institute for Computer Sciences, Social Informatics and Telecommunications Engineering, vol 194. Springer, Cham. https://doi.org/10.1007/978-3-319-58967-1_5

Download citation

  • DOI: https://doi.org/10.1007/978-3-319-58967-1_5

  • Published:

  • Publisher Name: Springer, Cham

  • Print ISBN: 978-3-319-58966-4

  • Online ISBN: 978-3-319-58967-1

  • eBook Packages: Computer ScienceComputer Science (R0)

Publish with us

Policies and ethics