Abstract
We propose a junctionless tunnel FET architecture with a heterostructure at the source/channel interface. We show that the use of a low bandgap material in the source of this device results in significant ON current improvement. We further show that ON current improvement can also be achieved by using a low-k isolation dielectric. The proposed device architecture which combines the merits of both junctionless FETs and Tunnel FETs can be a potential candidate for sub-20 nm technology node.
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References
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Gundapaneni, S., Konar, A., Bajaj, M., Murali, K.V.R.M. (2014). Improved Performance of Junctionless Tunnel FETs with Source/Channel Heterostructure. In: Jain, V., Verma, A. (eds) Physics of Semiconductor Devices. Environmental Science and Engineering(). Springer, Cham. https://doi.org/10.1007/978-3-319-03002-9_73
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DOI: https://doi.org/10.1007/978-3-319-03002-9_73
Publisher Name: Springer, Cham
Print ISBN: 978-3-319-03001-2
Online ISBN: 978-3-319-03002-9
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