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Thermodynamics and Heating Processes

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Chemical Solution Deposition of Functional Oxide Thin Films

Abstract

This chapter reviews the transformation of solution-derived ferroelectric thin films from the as-deposited to the crystalline state that occurs during heat treatment. Reaction chemistry and pathways associated with the elimination of organic constituents from the film are discussed, as are the thermodynamic and kinetic aspects of the nucleation and growth processes that lead to crystallization. Related topics discussed in this chapter include structural evolution during pyrolysis, thin film densification processes, the role of interfacial layers on film orientation, and control of thin film crystallization behavior and microstructure. A focus of the chapter is the consideration of solution chemistry effects on pyrolysis, densification and crystallization behavior and illustration of the magnitude of such effects on thin film microstructure.

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Notes

  1. 1.

    While copper oxidation is more prevalent at the higher temperatures associated with crystallization (due to the more rapid oxidation kinetics), we discuss such atmosphere effects here since copper oxidation has been noted to begin at temperatures as low as 250 °C [28] or in the temperature range used for pyrolysis.

  2. 2.

    Although [31] deals with the preparation of films by sputtering, the basic arguments regarding atmosphere effects are still pertinent.

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Authors and Affiliations

  1. University of Missouri System, Columbia, MO, USA

    Robert W. Schwartz

  2. Argonne National Laboratory, Lemont, IL, USA

    Manoj Narayanan

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  1. Robert W. Schwartz
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Editors and Affiliations

  1. RWTH Aachen University, Aachen, Germany

    Theodor Schneller

  2. RWTH Aachen University, Aachen, Germany

    Rainer Waser

  3. Jožef Stefan Institute, Ljubljana, Slovenia

    Marija Kosec

  4. University of Illinois at Urbana-Champai, Urbana, Illinois, USA

    David Payne

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Schwartz, R.W., Narayanan, M. (2013). Thermodynamics and Heating Processes. In: Schneller, T., Waser, R., Kosec, M., Payne, D. (eds) Chemical Solution Deposition of Functional Oxide Thin Films. Springer, Vienna. https://doi.org/10.1007/978-3-211-99311-8_15

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