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Aerosol Deposition

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Chemical Solution Deposition of Functional Oxide Thin Films

Abstract

Chemical Solution Deposition (CSD) offers a relatively robust fabrication route in the formation of complex metal oxide thin films. This utility stems largely from the straightforward control of film stoichiometry via the concentration of metallic components in the precursor solutions. There are several techniques by which these precursor solutions can be applied to substrates, each with their own merits that enable specific applications. The purpose of this chapter will be to describe the aerosol deposition of precursor solutions and to compare this technique against other established coating methods. The key processes by which aerosol deposition takes place will be examined and various deposition techniques will be explained on the basis of these processes. Finally, the characteristics of aerosol deposited films will be discussed and the applications in which aerosol deposition has been employed will be presented.

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Authors and Affiliations

  1. Symetrix Corporation, 5055 Mark Dabling Boulevard, Colorado Springs, CO, 80918, USA

    Matt D. Brubaker

  2. National Institute of Standards and Technology, 325 Broadway, Boulder, CO, 80305, USA

    Matt D. Brubaker

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  1. Matt D. Brubaker
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Correspondence to Matt D. Brubaker .

Editor information

Editors and Affiliations

  1. RWTH Aachen University, Aachen, Germany

    Theodor Schneller

  2. RWTH Aachen University, Aachen, Germany

    Rainer Waser

  3. Jožef Stefan Institute, Ljubljana, Slovenia

    Marija Kosec

  4. University of Illinois at Urbana-Champai, Urbana, Illinois, USA

    David Payne

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Brubaker, M.D. (2013). Aerosol Deposition. In: Schneller, T., Waser, R., Kosec, M., Payne, D. (eds) Chemical Solution Deposition of Functional Oxide Thin Films. Springer, Vienna. https://doi.org/10.1007/978-3-211-99311-8_12

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