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Simple Alkoxide Based Precursor Systems

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Chemical Solution Deposition of Functional Oxide Thin Films

Abstract

Along with the metal carboxylates (Chap. 2), metal alkoxides represent the most frequently applied class of chemical educts for coating solution synthesis. In this chapter, some fundamental aspects of metal alkoxides, which are important for the understanding of the different CSD approaches presented in other chapters of this book, are briefly reviewed. This includes structural aspects and their reactivity towards nucleophilic agents, such as water, alcohols etc. The basics of the sol-gel transition are also given, and how the reactivity of metal alkoxides can be modulated in order to stabilize them for coating solutions.

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Notes

  1. 1.

    The second, largely new edition of this popular book appeared in 2001 [1].

  2. 2.

    The metal methoxides are typically polymeric and do not dissolve in organic solvents. They decompose without melting and cannot be evaporated [3].

  3. 3.

    In contrast to single-source precursors (see Chap. 4), where well defined heterometallic precursor molecules are synthesized and used as precursors in the coating solution, multi-source means that individual educts, which could be alkoxides, carboxylates, nitrates are mixed together in such a way, that a chemically stable one-pot precursor solution results (see e.g. Chap. 3).

  4. 4.

    It should be noted that Kessler et al. [59] argumented that metal alkoxides are rather Lewis bases and very weak Lewis acids and that ligand exchange and hydrolysis proceeds through a proton assisted SN1 mechanism with a number of consequences. It is not the aim of this chapter to discuss this issue. In order to use and modify metal alkoxides for CSD precursor solution synthesis, as well as understanding the behavior at least on a qualitative level, the classical model description for the sol-gel behavior of alkoxides is very illustrative and will be therefore presented here.

  5. 5.

    Metal salts are not subject of this chapter. However the hint to the similarity in the hydrolysis and condensation scheme is given, because metal salts in aqueous media are used in the chemical bath deposition technique, which is described in Chap. 14.

  6. 6.

    In case of multicomponent Ti(OR)4 based precursor solutions often 2 equivalents of Hacac are used.

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Authors and Affiliations

  1. Institut für Werkstoffe der Elektrotechnik II, RWTH Aachen University, Aachen, Germany

    Theodor Schneller

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  1. Theodor Schneller
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Correspondence to Theodor Schneller .

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  1. RWTH Aachen University, Aachen, Germany

    Theodor Schneller

  2. RWTH Aachen University, Aachen, Germany

    Rainer Waser

  3. Jožef Stefan Institute, Ljubljana, Slovenia

    Marija Kosec

  4. University of Illinois at Urbana-Champai, Urbana, Illinois, USA

    David Payne

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Schneller, T. (2013). Simple Alkoxide Based Precursor Systems. In: Schneller, T., Waser, R., Kosec, M., Payne, D. (eds) Chemical Solution Deposition of Functional Oxide Thin Films. Springer, Vienna. https://doi.org/10.1007/978-3-211-99311-8_1

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