Abstract
Transparent ZnO/Al/ZnO multilayer electrodes that have been fabricated by atomic layer deposition were examined. The resistivity of multilayer electrodes strongly depended on the thickness of the inter-layer aluminum thin film. As the aluminum layer became thicker the resistivity decreased. By comparing theoretical calculations to experimental data we found that the resistivity change was mainly due to the carrier scattering mechanism. The transparent multilayer electrodes showed resistivities as low as 7 × 10−4 Ω-cm for 12 nm-thick Al inter-layer. The ZnO/Al/ZnO electrodes were implanted in organic solar cell devices. The best results were obtained for the ZnO(35 nm)/Al(6 nm)/ZnO(35 nm) configuration. The maximum power conversion efficiency and fill factor were 1.6% and 51%, respectively.
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Seo, I., Ryu, S.O. Characterization of transparent ZnO/Al/ZnO multilayer electrodes for applications in organic solar cells. Journal of the Korean Physical Society 66, 790–793 (2015). https://doi.org/10.3938/jkps.66.790
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DOI: https://doi.org/10.3938/jkps.66.790