Abstract
The influence of the initial composition of an HCl-H2 mixture on the steady-state parameters and composition of a dc glow discharge plasma (p = 40–200 Pa, i p = 15–35 mA) is investigated. The calculated data on the electron energy distributions, integral characteristics of the electron gas, and plasma composition are gathered. It is shown that the dilution of HCl with hydrogen is not accompanied by a noticeable variation either in the efficiency of processes under the electron impact or in the intensity of the ion bombardment of the surface in contact with the plasma.
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Plazmennaya tekhnologiya v proizvodstve SBIS (Plasma Technology in VLSI Production) Ainspruk, N. and Braun, D., Eds., Moscow: Mir, 1987.
Wolf, S. and Tauber, R.N., Silicon Processing for the VLSI Era, vol. 1: Process Technology, New York: Lattice Press, 2000.
Pearton, S.J., Ren, F., and Abernathy, C.R., Temperature-Dependent Dry Etching Characteristics of III-V Semiconductors in HBr- and HI-Based Discharges, Plasma Chem. Plasma Process., 1994, vol. 14, no. 2, p. 131.
Efremov, A.M., Svettsov, V.I., Sitanov, D.V., and Balashov, D.I., Kinetics and Mechanisms of Cl2 or HCl Plasma Etching of Copper, Thin Solid Films, 2008, vol. 516, pp. 4020–4027.
Efremov, A.M., Pivovarenok, S.A., and Svettsov, V.I., Plasma Parameters and Etching Mechanisms of Metals and Semiconductors in Hydrogen Chloride, Russ. Microelectron., 2009, vol. 38, no. 3, pp. 147–159.
Fuller, N.C.M., Donnelly, V.M., and Herman, I.P., Electron Temperatures of Inductively Coupled Cl2-Ar Plasmas, J. Vac. Sci. Technol. A, 2002, vol. 20, p. 170.
Efremov, A.M., Kim, G.H., Kim, J.G., Bogomolov, A.V., and Kim, C.I., On the Applicability of Self-Consistent Global Model for the Characterization of Cl2/Ar Inductively Coupled Plasma, Microelectron. Eng., 2007, vol. 84, p. 136.
Kim, M., Min, N.-K., Yun, S.J., Lee, H.W., Efremov, A., and Kwon, K.-H., Effect of Gas Mixing Ratio on Etch Behavior of ZrO2 Thin Films in BCl3/He Inductively Coupled Plasma, J. Vac. Sci. Technol., A, 2008, vol. 26, p. 344.
Efremov, A.M., Yudina, A.V., and Svettsov, V.I., Electrical Parameters of the dc Glow-Discharge Plasma in the HCl/Ar Mixture, Izv. Vyssh. Uchebn. Zaved., Khim. Khim. Tekhnol., 2011, vol. 54, no. 3, pp. 15–18.
Rokhlin, G.N., Razryadnye istochniki sveta (Discharge Optical Sources), Moscow: Energoagromizdat, 1991.
Efremov, A.M., Svettsov, V.I., and Balashov, D.I., Mathematical Modeling of Discharge in Hydrogen Chloride, Izv. Vyssh. Uchebn. Zaved., Khim. Khim. Tekhnol., 2003, vol. 46, no. 3, pp. 118–122.
Efremov, A.M., Yudina, A.V., Lemekhov, S.S., and Svettsov, V.I., Kinetics of Atomic-Molecular Reactions and Concentrations of Neutral Particles in the HCl Plasma and Its Mixtures with Chlorine and Hydrogen, Izv. Vyssh. Uchebn. Zaved., Khim. Khim. Tekhnol., 2011, vol. 54, no. 1, pp. 36–39.
Kupriyanovskaya, A.P., Rybkin, V.V., Sokolova, Yu.A., and Trostin, A.N., Kompilyatsiya dannykh po secheniyam elementarnykh protsessov dlya raschetov koeffitsientov skorostei protsessov v neravnovesnykh sistemakh (Compilation of the Data over the Sections of Elementary Processes for the Calculation of Coefficients of Process Rates in Nonequilibrium Systems), Available from VINITI, Cherkassy, 1990, no. 921-V90.
Gershenzon, Yu.M., Rozenshtein, V.B., and Umanskii, S.Ya., Heterogeneous Relaxation of Vibrational Energy of Molecules, in Khimiya plasmy (Chemistry of Plasma), Moscow: Atomizdat, 1977, issue 4, p. 61.
Efremov, A.M. and Svettsov, V.I., Plasma Parameters and Kinetics of Formation and Annihilation of Active Particles upon the Discharge in HCl, Teplofiz. Vys. Temp., 2006, vol. 44, no. 2, pp. 195–204.
Fizicheskie velichiny (Physical Quantities), Grigor’ev, I.S. and Meilikhov, E.Z., Eds., Moscow: Energoatomizdat, 1991, 1232.
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Original Russian Text © A.M. Efremov, A.V. Yudina, V.I. Svettsov, 2011, published in Mikroelektronika, 2011, Vol. 40, No. 6, pp. 405–412.
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Efremov, A.M., Yudina, A.V. & Svettsov, V.I. Electrical parameters and the plasma composition in HCl-H2 mixtures. Russ Microelectron 40, 371–378 (2011). https://doi.org/10.1134/S1063739711060059
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DOI: https://doi.org/10.1134/S1063739711060059