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Admittance Spectroscopy of Solar Cells Based on Selective Contact MoOx/Si Junction

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Abstract

The possibility of using admittance spectroscopy to characterize the quality of ITO/MoOx/n-Si structures is shown. It has been demonstrated that magnetron evaporation of ITO layer at room temperature leads to the formation of radiation defects in the near-surface region of Si near the MoOx/Si interface with a depth of 0.13 and 0.26 eV below the conduction band with a capture cross-section of (1–5) × 10–19 and (5–10) × 10–19 cm–2, respectively. An increase in the deposition temperature of the ITO layer to 130°C allows reducing the concentration below the sensitivity leading to a significant improvement of solar cells characteristics.

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Funding

The research presented in this paper was carried out within the framework of project No. 075-01024-21-00 of the state assignment of Ministry of Science and Higher Education of the Russian Federation.

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Correspondence to A. I. Baranov.

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Baranov, A.I., Kudryashov, D.A., Uvarov, A.V. et al. Admittance Spectroscopy of Solar Cells Based on Selective Contact MoOx/Si Junction. Tech. Phys. Lett. 47, 785–788 (2021). https://doi.org/10.1134/S1063785021080162

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  • DOI: https://doi.org/10.1134/S1063785021080162

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