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Investigation of Ruthenium Thin Layers Electrodeposition Process under Galvanostatic Conditions from Chloride Solutions

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Abstract

In this work, ruthenium coatings were obtained by the galvanostatic deposition onto a copper substrate. The amount of metallic deposit was increasing with the plating current. The XRD analysis identificated the phase composition and indicated that the change current density can significantly modify the grain orientation of deposits. Plating conditions influence on electrocatalytic performance of ruthenium layers were tested for hydrogen evolution reaction in 1 M NaOH solution. The best catalytic activity were obtained for sample deposited with –60 mA/cm2, what can be connected with good crystallinity and more developed electroactive surface area.

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ACKNOWLEDGMENTS

The autors would like to express their appreciation to MSc. Piotr Noga (UST-AGH, Faculty of Non-Ferrous Metals) for support with Scanning Electron Microscopy measurements.

Funding

This work was supported by the Polish National Center of Science under grants 2016/21/N/ST8/00222.

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Authors and Affiliations

  1. AGH University of Science and Technology, Faculty of Non-Ferrous Metals, Krakow, Poland

    D. Kutyła, K. Kołczyk, P. Żabiński, R. Kowalik, A. Kwiecińska & K. Skibinska

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  1. D. Kutyła
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  2. K. Kołczyk
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  3. P. Żabiński
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  4. R. Kowalik
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  5. A. Kwiecińska
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  6. K. Skibinska
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Correspondence to D. Kutyła.

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Kutyła, D., Kołczyk, K., Żabiński, P. et al. Investigation of Ruthenium Thin Layers Electrodeposition Process under Galvanostatic Conditions from Chloride Solutions. Russ J Electrochem 56, 214–221 (2020). https://doi.org/10.1134/S1023193520030064

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  • DOI: https://doi.org/10.1134/S1023193520030064

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