Abstract
Self-organization of nanosize domains in deposition of submonolayer carbon coatings on silicon (100) in a low-pressure microwave plasma has been revealed by scanning atomic-force and electron microscopy. It is shown that the nanosize carbon-containing domains can be used as masking coatings to obtain 3D low-dimensional systems on single-crystal silicon (100) by highly anisotropic plasma-chemical etching.
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Original Russian Text © R.K. Yafarov, V.Ya. Shanygin, 2014, published in Pis’ma v Zhurnal Tekhnicheskoi Fiziki, 2014, Vol. 40, No. 7, pp. 8–15.
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Yafarov, R.K., Shanygin, V.Y. Formation of carbon subnanosize masking coatings on silicon (100) in low-pressure microwave plasma. Tech. Phys. Lett. 40, 280–283 (2014). https://doi.org/10.1134/S1063785014040130
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DOI: https://doi.org/10.1134/S1063785014040130