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Amorphous Nickel Boride Deposited on Silicon Nanowires and Carbon Nanowall Templates for High-Performance Micro-supercapacitors

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Abstract

Transition metal materials (TMs) show promise as active materials for energy storage applications due to their excellent conductivity and electrochemical activity. In this study, amorphous nickel boride (a-NiB) was deposited onto high surface area templates comprising carbon nanowalls (CNW) and silicon nanowires (SiNWs) using a simple, cost-effective electroless process, for use as electrodes in electrochemical capacitors (ECs). The electrochemical performance of the electrodes was found to be influenced by the type of template used for the a-NiB deposition. Areal capacitances of 204.4 mF·cm−2 and 165.7 mF·cm−2 at a scan rate of 5 mV·s−1 were measured for CNWs-NiB and SiNW-NiB electrodes, respectively. In addition, both types of electrode materials displayed excellent charging/discharging stability after 10,000 cycles. A solid-state symmetric EC assembled with a CNW-NiB electrode exhibited a high areal capacitance of 42 mF·cm−2 at a high current density of 12 mA·cm−2. The CNW-NiB-based ECs can also deliver a high energy density of 19.1 mWh·cm−2 at 0.64 W·cm−2 with charging/discharging stability over 10,000 consecutive cycles.

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Acknowledgements

The authors gratefully acknowledge financial support from the National Natural Science Foundation of China (Nos. 52302032 and 52375395), Natural Science Foundation Grant of Hubei Province (No. 2023AFB007), Guangdong Basic and Applied Basic Research Foundation (No. 2022A1515110323), China Postdoctoral Science Foundation (No. 2022M722936), Fundamental Research Funds for the Central Universities, China University of Geosciences, Wuhan (No. CUG2021234), Postdoctoral Creative Research Post of Hubei Province and the Guiding project of Scientific Research Plan of Education Department of Hubei Province (No. B2022261).

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Authors and Affiliations

  1. Intelligent Equipment College, Shandong University of Science and Technology, Taiwan, 271000, China

    Bo Chen & Haoyu Tang

  2. Shenzhen Jufei Optoelectronics Co., Ltd, Shenzhen, 518111, China

    Ni Zhang

  3. Gemmological Institute, China University of Geosciences, Wuhan, 430074, China

    Qinglei Sun

  4. Shenzhen Research Institute, China University of Geosciences, Shenzhen, 518052, China

    Qinglei Sun

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Chen, B., Tang, H., Zhang, N. et al. Amorphous Nickel Boride Deposited on Silicon Nanowires and Carbon Nanowall Templates for High-Performance Micro-supercapacitors. J. of Materi Eng and Perform 33, 2268–2278 (2024). https://doi.org/10.1007/s11665-023-08776-7

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