Abstract
Nickel oxide thin films have been successfully deposited by dc reactive magnetron sputtering technique on glass substrates at different oxygen partial pressures. X-ray diffraction analysis revealed that the preferred orientation changed from (200) to (220) with increasing oxygen partial pressure. Fine grains with RMS roughness of 9.4 nm were observed at an oxygen partial pressure of 6 × 10−4 mbar.
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Mallikarjuna Reddy, A., Ashok Kumar Reddy, Y., Seshendra Reddy, C., Sivasankar Reddy, A., Sreedhara Reddy, P. (2013). Oxygen Partial Pressure Dependent Properties of Nanocrystalline Nickel Oxide Films. In: Giri, P.K., Goswami, D.K., Perumal, A. (eds) Advanced Nanomaterials and Nanotechnology. Springer Proceedings in Physics, vol 143. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-34216-5_17
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DOI: https://doi.org/10.1007/978-3-642-34216-5_17
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