摘要
在许多恶劣的工作环境中, 器件难免会曝露在电子束辐照下. 对于单原子层厚度的二维材料而言, 电子束辐照经常会造成其本征性能的衰减. 如何避开这一影响对于多功能化的二维异质结器件来讲至关重要. 然而, 电子束辐照对于二维异质结的影响至今仍缺乏充分深入的研究. 本工作发现利用异质结的堆垛可以阻碍单层二硫化钼(MoS2)由于电子束辐照带来的性能衰退. 通过在MoS2与基底之间插入单层石墨烯, 在同样剂量的电子束辐照轰击下, 异质结区域的光致发光强度始终大于纯单层MoS2; 而且与纯单层区域明显的发光能量变化相比, MoS2/石墨烯异质结区域的发光能量具有更佳的稳定性. 这一现象归因于石墨烯的阻隔效应: 由于单层石墨烯的存在抑制了基板对MoS2的影响. 此外, 我们也系统地揭示了电子束辐照对MoS2/石墨烯异质结拉曼光谱及电学传输特性的影响. 本工作不仅有助于加深人们对二维异质结辐照效应的认知, 同时也为新型抗辐射器件的设计开辟了新的途径.
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Acknowledgements
This work was supported by the National Natural Science Foundation of China (11774191, 51727805, and 51672152), the Open Research Fund Program of the State Key Laboratory of Low- Dimensional Quantum Physics (KF201603), and the Thousand Youth Talents Program of China.
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Shengzhe Hong obtained his bachelor’s degree at Taipei University of Technology in 2015, and is now a postgraduate student at Tsinghua University. His research interests are focused on the effects of electron-beam irradiation on twodimensional materials and heterostructures.
Kai Liu obtained his PhD degree from Tsinghua University in 2008. He joined Tsinghua University as an associtate professor in 2015 after a period of postdoctoral research at the Lawrence-Berkeley National Lab, USA. His current research is focused on syntheses and applications of low-dimensional materials and their composites or heterostructures.
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Hong, S., Fu, D., Hou, J. et al. Robust photoluminescence energy of MoS2/graphene heterostructure against electron irradiation. Sci. China Mater. 61, 1351–1359 (2018). https://doi.org/10.1007/s40843-018-9255-9
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DOI: https://doi.org/10.1007/s40843-018-9255-9