Abstract
In this paper, the infrared detection system based on the optical readout, based on the thermal bi-material micro-cantilever principle, was designed, and a new detector structure was put forward, including the antireflective layer, infrared absorption layer, supporting arm, and so on. The device material of layers was selected, and the manufacturing process flow of detector was designed. The manufacturing process of infrared detection unit based on the bi-material cantilever are studied systemically, including the sacrificial layer patterning process, PECVD deposition process of silicon nitride thin films, ICP etching process of silicon nitride thin films, and deposition processing of Au reflective layer. Through the study, the better process parameters were obtained, and the influence law of process parameters on device performance was mastered.
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Acknowledgments
This work was supported by Shaanxi Province Education Department Key Lab Project No. 2010JS003 and 11JS041, also supported by Chinese PLA General Armament Department Special Photoelectric Project No.4040***104 and Advanced Manufacturing Project 5131***303.
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Cai, C., Liu, W. Designing of infrared detector based on the bi-material micro-cantilever and its manufacturing process research. Microsyst Technol 21, 2033–2038 (2015). https://doi.org/10.1007/s00542-014-2298-1
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DOI: https://doi.org/10.1007/s00542-014-2298-1