Abstract
DC co-sputtered Carbon-Nickel and Carbon-Nitride-Nickel thin films were investigated by transmission electron microscopy, XPS and nanoindentation to clarify the influence of Nitrogen and Ni additions on the structure formation and mechanical properties of the films. The films were deposited by magnetron sputtering in argon or nitrogen plasma at temperatures from 25 to 800°C onto NaCl and Si+SiO2 substrates. The microstructures of the films can be described as nanocomposites, built from Ni or Ni3C nanocrystals in a carbon/CNx matrix. The mechanical properties of the films were found to be dependent on the substrate temperature during deposition along with the changes of the structure. The highest nanohardness of 14 GPa was measured for the film grown at 200°C, while low values (2 GPa) were obtained for high temperature deposition. The change of the hardness is thought to be primarily the consequence of morphological and phase changes of the films in the temperature range 200-800°C.
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Radnóczi, G. et al. (2004). Structure and Properties of Carbon Based Nanocomposite Films. In: Senkov, O.N., Miracle, D.B., Firstov, S.A. (eds) Metallic Materials with High Structural Efficiency. NATO Science Series II: Mathematics, Physics and Chemistry, vol 146. Springer, Dordrecht. https://doi.org/10.1007/1-4020-2112-7_9
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DOI: https://doi.org/10.1007/1-4020-2112-7_9
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