Abstract
Plasma chemical vapor deposition of hexamethyldisilazane was investigated for its applicability as solubility controlled gas separation membranes. Substrates were porous inorganic membranes (Anotec: 0.02 µ) for permeation measurements and silicon wafers for deposition rate, density, and infrared measurements. To ensure a uniform membrane on the porous support a deposit of five times the pore diameter was required. Membranes deposited at 2.45 GHz from HMDSN/O2 mixtures exhibit a high deposition rate (1.8 nm · s−1) and a wide density range (1.15–1.60 g · cm−3). — Typical nitrogen permeation rate of a 100 nm film was 2 · 10−8 m3 (STP) s−1 m−2 Pa−1. Permeation rates of CO2 and C4H10 related to N2 and the thermal dependence indicate that the permeation is viscosity controlled. These films exhibit a microgel-like structure with an estimated pore diameter of 2 nm. Anodic films prepared in a 13.56 MHz parallel plate reactor at low deposition rate (0.3 nm · s−1) have densities between 1.3 and 1.5 g · cm−3. They exhibit an infrared absorption of the ·:CH3 vibration at ∼1260 cm−1, which is an easy accessible indication of crosslinking and oxidation of more than twice than in microwave plasma films. For an 0.6-µm anodic film an ideal separation factor for CO2/N2 and C4H10/N2 of ∼6 is obtained, which is comparable to that of 1-µm conventional polydimethylsiloxane.
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Boenig H (1988) Fundamentals of Plasma Chemistry and Technology, Technomic Publishing Company, Inc., Lancaster, a review
Wertheimer MR, Moisan M (1985) Comparison of microwave and lower frequency plasmas for thin film deposition and etching. J Vac Sci Technol A3 6:1643
Weichart J, Müller J, Meyer B (1990) Beschichtung von dreidimensionalen Substraten mit einem magnetfeldunterstützten Mikrowellen-Plasma bei Raumtemperatur, Vakuum in der Praxis, 1/1991, Verlag Chemie, Weinheim
Peters D, Müller J, Sperling T (1990) Insulation and Passivation of 3-Dimensional Substrates by Plasma CVD Thin Films using Silicon-Organic Compounds. Second International Conference on Plasma Surface Engineering, 1990, Garmisch-Partenkirchen
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© 1991 Dr. Dietrich Steinkopff Verlag GmbH & Co. KG
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Weichart, J., Müller, J. (1991). Preparation and characterization of glassy plasma polymer membranes. In: Wünsche, P. (eds) Polymeric Layers. Progress in Colloid & Polymer Science, vol 85. Steinkopff. https://doi.org/10.1007/BFb0114819
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DOI: https://doi.org/10.1007/BFb0114819
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Publisher Name: Steinkopff
Print ISBN: 978-3-7985-0886-6
Online ISBN: 978-3-7985-1684-7
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