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Thin films for gas sensors in new application fields — MBRS studies and semiempirical calculations

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Advances in Solid State Physics 38

Part of the book series: Advances in Solid State Physics ((ASSP,volume 38))

Abstract

Reducing gases in air are detectable by a conductance increase of Ga2O3 films. In molecular beam relaxation spectroscopy (MBRS) Ga2O3 films are exposed to gas pulses of methane. The velocity constants of the desorption of the reaction products H2O and CO2 are observed. The desorption energies and the frequency factors are calculated (H2O: E a=0.2 eV, f a=2×103s−1; CO2: E a=1.0 eV, f a=100×103 s−1). Semiempirical Hartree-Fock calculations with the MNDO-PM3 method give information about the adsorption process. The energy gain of physisorption amounts to −0.27 eV. The HoF (Heat of Formation) of the chemisorbed CH3 group and the H atom is 4.05 eV lower in comparison to the value of the physisorbed methane. After the COlatt. group formation the energy gain is 7.33 eV. The binding energy of the formed COlatt. is calculated to 2.07 eV. The charge transfer is estimated using the mulliken charges. A reaction scheme for the catalytic oxidation of methane by lattice oxygen is proposed. The conductance increase of Ga2O3 on exposure to methane can be explained by the creation of oxygen vacancies and by the formation of absorbed hydrogen, both acting as surface donors. Ga2O3 layers with operating temperatures between 600 and 900 °C allow new applications for semiconductor gas sensors in harsh environments, e. g. the monitoring of combustion gases.

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Bernhard Kramer

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© 1999 Friedr. Vieweg & Sohn Verlagsgesellschaft mbH

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Ochs, T., Geyer, W., Krummel, C., Fleischer, M., Meixner, H., Kohl, D. (1999). Thin films for gas sensors in new application fields — MBRS studies and semiempirical calculations. In: Kramer, B. (eds) Advances in Solid State Physics 38. Advances in Solid State Physics, vol 38. Springer, Berlin, Heidelberg. https://doi.org/10.1007/BFb0107648

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  • DOI: https://doi.org/10.1007/BFb0107648

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  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-540-41575-6

  • Online ISBN: 978-3-540-44558-6

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