Abstract
In this paper, TiN thin films prepared based on magnetron sputtering are studied. The characteristics of TiN thin films fabricated by non-reactive direct current sputtering are analyzed by using X-ray photoelectron spectroscopy and ellipsometry polarization spectroscopy. By analysis, it is found that there are many N defects in the TiN thin film which results in a low refractive index in the visible range. After changing the manufacture process by introducing N doping, refractive index of the TiN film can be enhanced. The research in this article is helpful to understand the role of N2 in the deposition process of TiN films, and to provide a feasible solution for the regulation of TiN film properties.
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Acknowledgements
This work was partially supported by the National Key Research and Development Program (No. 2017YFB0403501), Science and Technology Program Project of State Administration for Market Regulation (2019MK147).
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Xu, K., Meng, YL., Liu, SM., Tan, J. (2021). Controllable Optical Characteristics of TiN Films Prepared by Magnetron Sputtering. In: Peng, Y., Dong, X. (eds) Proceedings of 2019 International Conference on Optoelectronics and Measurement. Lecture Notes in Electrical Engineering, vol 726. Springer, Singapore. https://doi.org/10.1007/978-981-33-4110-4_16
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DOI: https://doi.org/10.1007/978-981-33-4110-4_16
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