Abstract
In recent years improvement in the design of SRAM cell increases drastically. The two major factors which have to be taken care are power dissipation and the noise margin of the SRAM cell. The power is subdivided into two groups that are switching power and standby power. The leakage current plays an important role in the power dissipation and has to be taken care. The noise margin also categorized as read margin and write margin. The purpose of this paper is to analyze and optimize the SRAM cell operation with respect to power and also measure the noise margin. The results show the low power operation of SRAM cell with relatively improved noise margin.
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References
Pavlov, A., Sachdev, M.: CMOS SRAM Circuit Design and Parametric Test in Nano-scaled Technologies: Process-Aware SRAM Design and Test. Springer Science (2008)
Farkhani, H., et al.: A new asymmetric 6T SRAM cell with a write assist technique in 65 nm CMOS technology. Elsevier Microelectron. J. 45, 1556–1565 (2014)
Hassanzadeh, S., et al.: A novel low power 8T-cell sub-threshold SRAM with improved Read-SNM. In: International Conference on Design & Technology of Integrated Systems in Nanoscale Era (DTIS), pp. 35–38, March (2013)
Dhilleswararao, P., et al.: High SNM 32 nm CNFET based 6T SRAM Cell design considering transistor ratio. In: International Conference on Electronics and Communication System (lCECS-2014), pp. 1–6, Feb (2014)
Wang, W., et al.: High SNM 6T CNFET SRAM cell design considering nanotube diameter and transistor ratio. In: IEEE International Conference on Electro/Information Technology (EIT), pp. 1–4, May (2011)
Madiwalar, B., et al.: Single bit-line 7T SRAM cell for low power and high SNM. In: International Multi-conference on Automation, Computing, Communication, Control and Compressed Sensing (iMac4s), pp. 223–228, March (2013)
Sil, A., et al.: A novel high write speed, low power, read-SNM-free 6T SRAM cell. In: Midwest Symposium on Circuits and Systems, pp. 771–774, Aug (2008)
Sil, A., et al.: A novel 8T SRAM cell with improved read-SNM. In: IEEE Northeast Workshop on Circuits and Systems, pp. 1289–1292, Aug (2007)
Solanki, S., et al.: A low-leakage single-ended 6T SRAM cell. In: 3rd International Conference on Emerging Trends in Engineering and Technology (ICETET), pp. 698–702, Nov (2010). ISSN 2157-0477
Chen, S.-Y., et al.: Single-ended disturb-free 5T loadless SRAM Cell using 90 nm CMOS process. In: IEEE International Conference on IC Design & Technology (ICICDT), pp. 1–4, June (2012). ISBN 978-1-4673-0146-6
Giraud, B., et al.: A novel 4T asymmetric single-ended SRAM cell in sub-32 nm double gate technology. In: IEEE International Symposium on Circuits and Systems, pp. 1906–1909, May (2008). ISBN 978-1-4244-1683-7
Singh, J., et al.: A subthreshold single ended I/O SRAM cell design for nanometer CMOS technologies. In: IEEE International SOC Conference, pp. 243–246, Sept (2008). ISBN 978-1-4244-2596-9
Kushwah, C.B., et al.: A single-ended with dynamic feedback control 8T subthreshold SRAM cell. IEEE Trans. Very Large Scale Integr. (VLSI) Syst. 1–5 (2015). ISSN: 1063-8210
Hobson, R.F.: A new single-ended SRAM cell with write-assist. IEEE Trans. Very Large Scale Integr. (VLSI) Syst. 15(2), 173–181 (2007). ISSN 1063-8210
Yang, Y., et al.: Single-ended 9T SRAM cell for near-threshold voltage operation with enhanced. IEEE Trans. Very Large Scale Integr. (VLSI) Syst. (99), 1–5 (2014). ISSN: 1063-8210
Li, Q., et al.: A 5.61 pJ, 16 kb 9T SRAM with single-ended equalized bitlines and fast local write-back for cell stability improvement. In: Proceedings of the European Solid-State Device Research Conference (ESSDERC), pp. 201–204, Sept (2012). ISBN 978-1-4673-1707-8
Wen, L., et al.: Single-ended, robust 8T SRAM cell for low-voltage operation. Microelectron. J. 44(8), 718–728 (2013)
Anand, N., et al.: Highly stable subthreshold single-ended 7T SRAM cell. In: 2nd International Conference on Emerging Technology Trends in Electronics, Communication and Networking (ET2ECN), pp. 1–4, Dec (2014). ISBN 978-1-4799-6985-2
Ichikawa, T., et al.: A new analytical model of SRAM cell stability in low-voltage operation. IEEE Trans. Electron Devices 43(1), 54–61 (2002). ISSN: 0018-9383
Chang, L., et al.: An 8T-SRAM for variability tolerance and low-voltage operation in high-performance caches. Solid-State Circuits 43(4), 956–963 (2008). ISSN: 0018-9200
Mann, R.W., et al.: Impact of circuit assist methods on margin and performance in 6T SRAM. Solid State Electron. J. 54, 1398–1407 (2010)
Zhang, K., et al.: A 3-GHz 70 Mb SRAM in 65 nm CMOS technology with integrated column-based dynamic power supply. In: IEEE International Solid-State Circuits Conference, pp. 474–611, February (2005)
Kaur, R., et al.: A 6T SRAM cell based pipelined 2R/1W memory design using 28 nm UTBB-FDSOI. In: 28th IEEE International System-on-Chip Conference (SOCC), pp. 310–315, September (2015)
Sinangil, M.E., et al.: A 45 nm 0.5 V 8T column-interleaved SRAM with on-chip reference selection loop for sense-amplifier. In: IEEE Asian Solid-State Circuits Conference, pp. 225–228, November (2009)
Wang, D.P., et al.: A 45 nm dual-port SRAM with write and read capability enhancement at low voltage. In: IEEE International SOC Conference, pp. 211–214, September (2007)
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Ojha, S.K., Singh, O.P., Mishra, G.R., Vaya, P.R. (2020). Analysis of SRAM Cell for Low Power Operation and Its Noise Margin. In: Dutta, D., Kar, H., Kumar, C., Bhadauria, V. (eds) Advances in VLSI, Communication, and Signal Processing. Lecture Notes in Electrical Engineering, vol 587. Springer, Singapore. https://doi.org/10.1007/978-981-32-9775-3_38
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DOI: https://doi.org/10.1007/978-981-32-9775-3_38
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