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Fabrication Techniques and Materials for Bio-MEMS

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MEMS and Microfluidics in Healthcare

Part of the book series: Lecture Notes in Electrical Engineering ((LNEE,volume 989))

Abstract

Microelectromechanical systems (MEMS) based advanced point-of-care rapid diagnostic solutions with high degree of sensitivity along with high accuracy are required that can remain efficient even after a decrement in the form factor of the sensor. MEMS technology is at the forefront of development of miniaturized biosensor devices in bulk batches that offer a highly efficient, sensitive, accurate, precise and commercial platform. Arranged arrays of MEMS devices can be spatially covered in more than an area of 1000 mm2. Bio-MEMS devices are fabricated by the conventional micromachining techniques employing oxidation, thin film deposition by sputtering, e-beam & thermal evaporation, and chemical vapor deposition (CVD). Photolithography is applied for patterning of the micrometre sized geometrical shapes, while electron beam lithography (EBL) patterns nanostructures down to few nanometres scale in reference to the nano-electromechanical-systems (NEMS) for advanced bio-detection applications including lab-on-a-chip technology. Bulk micromachining offers high commercially viable technology involving selective removal by etching of the bulk substrate materials that develop MEMS components, such as, cantilevers and beams. Wet or dry etching methods can be employed for the bulk substrate material removal by selective elimination of unmasked areas for the patterning of geometrical shapes and patterns. Faster etch rates are obtained by chemical wet etching while dry etching technique offers fabrication of anisotropic geometrical patterns with high aspect ratio. Lift-off is also a conventional commercial technique that develops patterns on the surface of the material. Stereo-lithography is an advanced 3D fabrication technology that has a commercial orientation focused on ultraviolet (UV) radiation-based curing of the polymer solution for fabrication of high aspect ratio structures in a layer-by-layer approach. Bio-MEMS/NEMS relies on different types of biomaterials, such as, DNA and RNA, that are used as biomimetic materials. The other categories are inorganic (Si, GaAs, Ge, SiC, Si3N4, SiO2 and glass/quartz for biomedical applications) and organic materials (PMMA, SU-8, PDMS,) for use in MEMS/NEMS. Polymers and plastic substrates are more favourable because of ease of micromachining, faster prototyping along with higher mechanical bending characteristics, and low costs. Moreover, optically transparent substrates can be used in optical detection techniques along with being biologically compatible. Paper microfluidics is another special variant of bio-MEMS due to its features of low-cost technology, biodegradable nature along with the normal wicking action. Paper microfluidics has been employed in paper immunoassays and electrophoresis. Microfluidic approaches in reference to bio-MEMS manipulates very small quantities of fluid over the microfabricated substrates and combines electronics for rapid testing device prototypes. There have also been efforts for the fabrication of microchannels in glass and/or fused quartz and other similar types of substrates using ultrafast lasers for microfluidics that combine optical detection techniques as well. This chapter is a concise effort to present an overview of various micro- and nanofabrication technologies for bio-MEM/NEMS device fabrication for sensing platforms. Technical nitty-gritties of photolithography and EBL have been presented in a critical manner along with different materials used in the advanced bio-MEMS/NEMS micro- and nanofabrication. A small portion is also devoted to the description of cleanroom technology including its classifications with a note on international standardization protocols. Apart from this, deposition techniques have also been discoursed in special reference to bio-MEMS/NEMS. Superhydrophobic feature or wetness property and its importance in the bio-MEMS/NEMS based sensing platforms have also been discussed.

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References

  1. Crone WC (2008) A brief introduction to MEMS and NEMS. In: Sharpe W (eds) Springer handbook of experimental solid mechanics. Springer handbooks. Springer, Boston, MA. https://doi.org/10.1007/978-0-387-30877-7_9

  2. Senthil Kumar PJ, Sankaranarayanan R, Jennifa Sujana AJ, Hynes JRN (2021) Advantages and disadvantages of nanodevices. In: Verpoort F, Ahmad I, Ahmad A, Khan A, Chee YC (eds) Nanomedicine manufacturing and applications. A vol. in micro and nano technologies. Elsevier https://doi.org/10.1016/C2019-0-02508-3

  3. Young DJ, Zorman CA, Mehregany M (2004) MEMS/NEMS devices and applications. In: Bhushan B (ed) Springer handbook of nanotechnology. Springer handbooks. Springer Berlin, Heidelberg. https://doi.org/10.1007/3-540-29838-X_8

  4. Katta M, Sandanalakshmi R (2018) A technology overview and future scope of bio-MEMS in tropical disease detection. Rev Int J Eng Technol 7:648–651. https://doi.org/10.14419/ijet.v7i3.12.16446

  5. Chircov C, Grumezescu MA (2022) Microelectromechanical (MEMS) systems for biomedical applications. Micromachines 13(1–31):164. https://doi.org/10.3390/mi13020164

  6. Madou JM (2011) From MEMS to bio-MEMS and bio-NEMS (Manufacturing Techniques and Applications). CRC Press, Boca Raton. https://doi.org/10.1201/9781439895245

  7. Maheshwari N, Chatterjee G, Rao RV (2014) A technology overview and applications of bio-MEMS. Smart Struct Syst 3:39–59

    Google Scholar 

  8. Lin L, Li Z, Feng J, Zhang Z (2013) Indirect to direct band gap transition in ultra-thin silicon films. Phys Chem Chem Phys 15:6063–6067. https://doi.org/10.1039/C3CP50429H

    Article  Google Scholar 

  9. Fadaly TME, Dijkstra A, Suckert RJ, Ziss D, van Tilburg JAM, Mao C, Ren Y, van Lange TV, Korzun K, Kölling S, Verheijen AM, Busse D, Rödl C, Furthmüller J, Bechstedt F, Stangl J, Finley JJ, Botti S, Haverkort MEJ, Bakkers MAPE (2020) Direct-bandgap emission from hexagonal Ge and SiGe alloys. Nature 580:205–228. https://doi.org/10.1038/s41586-020-2150-y

    Article  Google Scholar 

  10. Mahalik PN (2006) Micromanufacturing and nanotechnology. Springer Berlin, Heidelberg. https://doi.org/10.1007/3-540-29339-6

  11. Hubenthal F (2011) Noble metal nanoparticles: synthesis and optical properties 1, 375–435. In: Andrews LD, Scholes DG, Wiederrecht PG (eds) Comprehensive nanoscience and technology. Elsevier. https://doi.org/10.1016/B978-0-12-374396-1.00034-9

  12. Cirelli AR, Watson PG, Nalamasu O (2001) In encyclopedia of materials: science and technology. Elsevier Science Ltd., pp 6441–6449

    Google Scholar 

  13. May SG, Sze SM (2004) Fundamentals of semiconductor fabrication. Wiley

    Google Scholar 

  14. Ghandhi KS (1994) VLSI fabrication principles. Wiley

    Google Scholar 

  15. Turner RS, Daly CR (1988) Polymers in microlithography. J Chem Edu 65:322–325. https://doi.org/10.1021/ed065p322

  16. Licari JJ, Enlow RL (1998) Thin film processes. 63–103. In: Hybrid microcircuit technology handbook (materials, processes, design, testing and production). https://doi.org/10.1016/B978-081551423-7.50005-5

  17. Ceyssens F, Puers R (2012) SU-8 photoresist. In: Bhushan B (ed) Encyclopedia of nanotechnology. Springer. https://doi.org/10.1007/978-90-481-9751-4

  18. Besaucele H, Das PP, Duffey PT, Embree JT, Ershov IA, Fleurov BV, Grove LS, Melcher CP, Ness MR, Padmabandu GG (2000) Comparison of ArF and KrF laser performance at 2 kHz for microlithography. In: Proceedings of the SPIE 4000, optical microlithography XIII. https://doi.org/10.1117/12.388986

  19. Endert H, Pȁtzel R, Powell M, Rehban U, Basting D (1995) New KrF and ArF excimer laser for advanced DUV lithography. Microelectronic Engg. 27:221–224. https://doi.org/10.1016/0167-9317(94)00093-A

    Article  Google Scholar 

  20. Maalouf A, Gadonna M, Bose D (2009) An improvement in standard photolithography resolution based on Kirchhoff diffraction studies. J Phys D Appl Phys 42(1–11):015106. https://doi.org/10.1088/0022-3727/42/1/015106

  21. Kumar V, Pallapa M, Rezai P, Selvaganapathy RP (2015) Polymers. In: Reference module in materials science materials engineering. Elsevier. https://doi.org/10.1016/B978-0-12-803581-8.00522-1

  22. Bourdillon JA, Boothroyd BC, Kong RJ, Vladimirsky Y (2000) A critical condition in Fresnel diffraction used for ultra-high resolution lithographic printing. J Phys D Appl Phys 33:2133–2141. https://doi.org/10.1088/0022-3727/33/17/307

    Article  Google Scholar 

  23. Jain K, Willson CG, Lin BJ (1982) Ultrafast high-resolution contact lithography with excimer lasers. IBM J Res Dev 26:151–159. https://doi.org/10.1147/rd.262.0151

    Article  Google Scholar 

  24. Mojarad N, Hojeij M, Wang L, Gobrecht J, Ekinci Y (2015) Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond. Nanoscale 7:4031–4037. https://doi.org/10.1039/C4NR07420C

  25. French RH (2012) Immersion lithography. In: Bhushan B (ed) Encyclopedia of nanotechnology. Springer, Dordrecht. https://doi.org/10.1007/978-90-481-9751-4_354

  26. Owa S, Nagasaka H (2003) Immersion lithography: its potential performance and issues. In: Proceedings of the SPIE 5040, optical microlithography XVI. https://doi.org/10.1117/12.504599

  27. Sandle T (2013) Cleanrooms, isolators and cleanroom technology. In: Sterility, sterilization and sterility assurance for pharmaceuticals (technology, validation and current regulations). https://doi.org/10.1533/9781908818638.189

  28. https://en.wikipedia.org/wiki/Cleanroom

  29. Alkaisi MM, Blaikie JR, McNab JS (2000) 70 nm features on 140 nm period using evanescent near field optical lithography. Microelectronic Engg. 53:237–240. https://doi.org/10.1016/S0167-9317(00)00305-1

    Article  Google Scholar 

  30. Naulleau P (2012) Optical lithography. Lawrence Berkeley National Laboratory, Berkeley, CA

    Google Scholar 

  31. Pease WFR (1981) Electron beam lithography. Contemp Phys 22:265–290. https://doi.org/10.1080/00107518108231531

    Article  Google Scholar 

  32. Pala N, Karabiyik M (2016) Electron beam lithography. In: Bhushan B (ed) Encyclopedia of nanotechnology. Springer, Dordrecht. https://doi.org/10.1007/978-94-017-9780-1

  33. Willson GC, Stewart DM (2001) Photoresists. In: Buschow JHK, Flemings CM, Kramer JE, Veyssiere P, Cahn WR, Ilschner B, Mahajan S (eds) Encyclopedia of materials: science and technology, 2nd edn. pp 6973–6977. https://doi.org/10.1016/B0-08-043152-6/01235-3

  34. García-Arribas A, Fernandez E, Barrainkua A, Svalov AV, Kurlyandskaya GV, Barandiaran JM (2012) Comparison of microfabrication routes for magneto-impedance elements: Lift-off and wet-etching. IEEE Trans Magn 48:1601–1604. https://doi.org/10.1109/TMAG.2011.2173167

    Article  Google Scholar 

  35. Cheung MK, Stemer MD, Zhao C, Young DT, Belling NJ, Andrews MA, Weiss SP (2019) Chemical lift-off lithography of metal and semiconductor surfaces. ACS Mater Lett 2:76–83. https://doi.org/10.1021/acsmaterialslett.9b00438

    Article  Google Scholar 

  36. Sze S (1988) VLSI technology. McGraw-Hill Science. ISBN 0070627355 (ISBN13: 9780070627352)

    Google Scholar 

  37. House D, Li D (2008) Anisotropic etching. In: Li D (eds) Encyclopedia of microfluidics and nanofluidics. Springer, Boston, MA. https://doi.org/10.1007/978-0-387-48998-8_35

  38. Morozov AI (2017) Influence of dry etching condition to geometry of vertically aligned silicon nanostructures. J Phys Conf Ser 917(1–5): 052030. https://doi.org/10.1088/1742-6596/917/5/052030

  39. Ganjian M, Modaresifar K, Zhang H et al (2019) Reactive ion etching for fabrication of biofunctional titanium nanostructures. Sci Rep 9:18815. https://doi.org/10.1038/s41598-019-55093-y

    Article  Google Scholar 

  40. Huang J, Qin Q, Wang J (2020) A review of stereolithography: processes and systems. Processes 8(1–16):1138. https://doi.org/10.3390/pr8091138

  41. ebrary.net/158129/engineering/liquid_based_additive_manufacturing_systems#122202

  42. Nishat S, Jafry TA, Martinez WA, Awan RF (2021) Paper-based microfluidics: simplified fabrication and assay methods. Sens Actuat B Chem 336:129681. https://doi.org/10.1016/j.snb.2021.129681

    Article  Google Scholar 

  43. Reboud J, Xu G, Garrett A, Adriko M, Yang Z, Tukahebwa ME, Rowell C, Cooper MJ (2019) Paper-based microfluidics for DNA diagnostics of malaria in low resource underserved rural communities. Proc Natl Acad Sci USA 116:4834–4842. https://doi.org/10.1073/pnas.1812296116

    Article  Google Scholar 

  44. Noviana E, Ozer T, Carrell SC, Link SJ, McMahon C, Jang I, Henry SC (2021) Microfluidic paper-based analytical devices: from design to applications. Chem Rev 121:11835–11885. https://doi.org/10.1021/acs.chemrev.0c01335

    Article  Google Scholar 

  45. Ghosh R, Gopalakrishnan S, Savitha R (2019) Fabrication of laser printed microfluidic paper-based analytical devices (LP-µPADs) for point-of-care applications. Sci Rep 9(1–11):7896. https://doi.org/10.1038/s41598-019-44455-1

  46. Abegunde OO, Akinlabi TE, Oladijo PO, Akinlabi S, Ude UA (2019) Overview of thin film deposition techniques. AIMS Mater Sci 6:174–199. https://doi.org/10.3934/matersci.2019.2.174

    Article  Google Scholar 

  47. Rossnagel MS (2003) Thin film deposition with physical vapor deposition. J Vac Sci Technol A 21:S74–S87. https://doi.org/10.1116/1.1600450

    Article  Google Scholar 

  48. Dwivedi S (2020) Fabrication and manufacturing process of solar cell: Part I. In: Tripathi LS, Padmanaban S (eds) Green energy: solar energy, photovoltaics, and smart cities. Wiley Online, pp 1–37. https://doi.org/10.1002/9781119760801.ch1

  49. Dwivedi S (2014) Spintronics: the realm of nanotechnology. In: Islam N (ed) Nanotechnology: recent trends. Nova Publishers, USA, Emerging issues and future directions, pp 311–335

    Google Scholar 

  50. Dwivedi S, Biswas S (2018) Enhanced magnetoresistance in pulsed laser deposited stable chromium oxide thin films. Thin Solid Films 655:13–21. https://doi.org/10.1016/j.tsf.2018.03.093

    Article  Google Scholar 

  51. Dwivedi S, Jadhav J, Sharma H, Biswas S (2014) Pulsed laser deposited ferromagnetic chromium dioxide thin films for applications in spintronics. Phys Proc 54:62–69. https://doi.org/10.1016/j.phpro.2014.10.037

    Article  Google Scholar 

  52. Dwivedi S, Biswas S (2012) Pulsed laser deposition of half-metallic CrO2 thin films for spintronic applications. Int Conf Emerg Electron 1–4. https://doi.org/10.1109/ICEmElec.2012.6636271

  53. Dwivedi S, Biswas S (2013) Effects of annealing on pulsed laser deposited TiO2 thin films. Appl Mech Mater 446–447:306–311. https://doi.org/10.4028/www.scientific.net/amm.446-447.306

    Article  Google Scholar 

  54. Kelly PJ, Arnell RD (2000) Magnetron sputtering: a review of recent developments and applications. Vacuum 56:159–172

    Article  Google Scholar 

  55. www.semicore.com/news/93-what-is-hipims

  56. vaccoat.com/blog/pulsed-dc-magnetron-sputtering/#Pulsed_DC_Magnetron_Sputtering

  57. Creighton JR, Ho P (2001) Introduction to chemical vapor deposition (CVD). Chem Vapor Depos 2:1–22. www.asminternational.org/documents/10192/1849770/ACFAA6E.pdf

  58. Dwivedi S Nanoelectronics. In: Birla S, Singh N, Shukla KN (eds) Nanotechnology: device design and applications. CRC Press, Boca Raton. https://doi.org/10.1201/9781003220350

  59. Jones CA, Hitchman LM (2009) Chemical vapor deposition: precursors, processes and applications. R Soc Chem 1–36. https://doi.org/10.1039/9781847558794

  60. Hamedani Y, Macha P, Bunning JT, Naik RR, Vasudev CM (2016) Plasma-enhanced chemical vapor deposition: where we are and the outlook for the future. In: Neralla S (ed) Chemical vapor deposition—recent advances and applications in optical, solar cells and solid state devices. InTechOpen. https://doi.org/10.5772/61559

  61. Alti K, Dwivedi S, Chidangil S, Mathur D, Khare A (2015) Micro-patterning of Indium thin film for generation of micron and submicron particles using femtosecond laser-induced forward transfer. Laser Part Beams 33:449–454. https://doi.org/10.1017/S0263034615000476

    Article  Google Scholar 

  62. Bhushan B (2011) MEMS/NEMS and bioMEMS/bioNEMS: materials, devices and biomimetics. In: Bhushan B (ed) Nanotribology and nanomechanics, vol. 23, 833–945. https://doi.org/10.1007/978-3-642-15263-4_23

  63. Yilbas SB, Al-Sharafi A, Ali H (2019) Surfaces for self-cleaning. In: Self-cleaning of surfaces and water droplet mobility. Elsevier, pp 45–98. https://doi.org/10.1016/B978-0-12-814776-4.00003-3

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Dwivedi, S. (2023). Fabrication Techniques and Materials for Bio-MEMS. In: Guha, K., Dutta, G., Biswas, A., Srinivasa Rao, K. (eds) MEMS and Microfluidics in Healthcare. Lecture Notes in Electrical Engineering, vol 989. Springer, Singapore. https://doi.org/10.1007/978-981-19-8714-4_6

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