Abstract
Aluminium gallium nitride/gallium nitride (AlGaN/GaN) (AlGaN/GaN) have become a major focus for all electronic devices based on GaN, due to the beneficial merger of material properties, including a good thermal conductivity, a wide band gap, high peak and saturated electron velocity, high critical breakdown field, and the capability to set up high-quality hetero-interfaces that forms a high sheet density two-dimensional electron gas (2DEG). Various structures have been proposed to increase the breakdown voltage (Vbr) of the device. One of them is introduction of a field plate (FP). In this paper, various types of FPs are considered and compared with respect to the Vbr characteristics and analogue characteristics.
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Kharei, P., Baidya, A., Maity, N.P. (2023). Comparative Analysis of Different Types of Gate Field Plate AlGaN/GaN HEMT. In: Lenka, T.R., Misra, D., Fu, L. (eds) Micro and Nanoelectronics Devices, Circuits and Systems. Lecture Notes in Electrical Engineering, vol 904. Springer, Singapore. https://doi.org/10.1007/978-981-19-2308-1_10
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DOI: https://doi.org/10.1007/978-981-19-2308-1_10
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