Abstract
In laser heat-mode lithography, the resist thin films absorb the laser spot energy and are heated, and then experience a structural change when the temperature exceeds to certain threshold point, such as crystallization, melting, and gasification.
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References
T. Wei, J. Wei, Y. Wang, L. Zhang, Manipulation and simulations of thermal field profiles in laser heat-mode lithography. J. Appl. Phys. 122, 223107 (2017)
C. Deng, Y. Geng, Y. Wu, Y. Wang, J. Wei, Adhesion effect of interface layers on pattern fabrication with GeSbTe as laser thermal lithography film. Microelectron. Eng. 103, 7–11 (2013)
J. Wei, K. Zhang, T. Wei, Y. Wang, Y. Wu, M. Xiao, High-speed maskless nanolithography with visible light based on photothermal localization. Sci. Rep. 7, 43892 (2017)
E. Ito, Y. Kawaguchi, M. Tomiyama, S. Abe, E. Ohno, TeOx-based film for heat-mode inorganic photoresist mastering. Jpn. J. Appl. Phys. 44(5B), 3574–3577 (2005)
K. Zhang, Z. Chen, J. Wei, T. Wei, Y. Geng, Y. Wang, Y. Wu, A study on one-step laser nanopatterning onto copper-hydrazone-complex thin films and its mechanism. Phys. Chem. Chem. Phys. 19(20), 13272–13280 (2017)
Y. Usami, T. Watanabe, Y. Kanazawa, T. Kazuaki, K. Hiroshi, I. Kimio, 405Â nm laser thermal lithography of 40Â nm pattern using super resolution organic resist material. Appl. Phys. Express 2(12), 126502 (2009)
X. Jiao, J. Wei, F. Gan, M. Xiao, Temperature dependence of thermal properties of Ag8In14Sb55Te23 phase-change memory materials. Appl. Phys. A 94, 627–631 (2009)
M. Kuwahara, J. Li, C. Mihalcea, N. Atoda, J. Tominaga, L. Shi, Thermal lithography for 100-nm dimensions using a nano-heat spot of a visible laser beam. Jpn. J. Appl. Phys. 41 (Part 2), L1022-L4 (2002)
Q. Wang, J. Maddock, E. Rogers, T. Roy, 1.7Gbit/in.2 gray-scale continuous-phase-change femtosecond image storage. Appl. Phys. Lett. 104(12), 121105 (2014)
J. Wei, Y. Wang, Y. Wu, Manipulation of heat-diffusion channel in laser thermal lithography. Opt. Express 22, 32470–32481 (2014)
X. Jiao, J. Wei, F. Gan, Si Underlayer induced nano-ablation in AgInSbTe thin films. Chin. Phys. Lett. 25, 209–211 (2008)
H. Li, R. Wang, Y. Geng, Y. Wu, J. Wei, Enhancement effect of patterning resolution induced by an aluminum thermal conduction layer with AgInSbTe as a laser thermal lithography film. Chin. Phys. Lett. 29(7), 074401 (2012)
H. Miura, N. Toyoshima, Y. Hayashi, S. Sangu, N. Iwata, J. Takahashi, Patterning of ZnS-SiO2 by laser irradiation and wet etching. Jpn. J. Appl. Phys. 45(2B), 1410–1413 (2006)
T. Mori, New approach to fabrication of minute columnar and ring patterns with ZnS, SiO2, and Zn. Jpn. J. Appl. Phys. 48, 010221 (2009)
Q. Zhou, K. Zhang, T. Wei, J. Wei, High resolution patterning on AgInSbTe thin films by laser thermal lithography. Proc. SPIE 9818, 98180Y (2016)
T. Shintani, Y. Anzai, H. Minemura, H. Miyamoto, Nanosize fabrication using etching of phase-change recording films. Appl. Phys. Lett. 85(4), 639–641 (2004)
H. Li, Preparation and properties of chalcogenide thin films for laser thermal lithography. Dissertation for the doctor degree of University of Chinese Academy of Sciences (2012)
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Wei, J. (2019). Manipulation of Thermal Diffusion Channels. In: Laser Heat-Mode Lithography. Springer Series in Materials Science, vol 291. Springer, Singapore. https://doi.org/10.1007/978-981-15-0943-8_4
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DOI: https://doi.org/10.1007/978-981-15-0943-8_4
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