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Comparative Analysis of 6-T SRAM Cell in Terms of Power Using CMOS and DGMOS

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Book cover Computational Advancement in Communication Circuits and Systems

Part of the book series: Lecture Notes in Electrical Engineering ((LNEE,volume 575))

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Abstract

As we know for current industry, downscaling of MOSFET is a very essential factor, but due to downscaling, the performance of MOS degrades. For robust design, it is very much required to downscale the MOS length keeping the performance of MOSFET intact. The multigate MOS model has been introduced for keeping the MOS performance intact as well as reducing the channel length. In this paper, the comparison of 6-T single bit SRAM cell has been done using single-gate MOS and double-gate MOS in terms of power using CMOS technology and 90-nm channel length in SYMICA environment. SYMICA is an electronic design automation (EDA) tool for the analog and mixed-signal integrated circuit design. In this paper, we have simulated CMOS and DGMOS SRAM cell and compare the power dissipation of DGMOS SRAM cell and CMOS SRAM cell. It proves that the dynamic power consumption of DGMOS SRAM cell is much smaller than CMOS SRAM cell for a particular input voltage and channel length.

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References

  1. R. Gatkal, G. Mali, Low power CMOS inverter in nanometer technology, in International Conference on Communication and Signal Processing, April 6–8, 2016, India, November 19 (2013)

    Google Scholar 

  2. K. Kuhn et al., Managing process variation in Intel’s 45 nm CMOS Technology. Intel Technol. 12(2), 92–110 (2008)

    Google Scholar 

  3. K. Bernstein, D.J. Frank, A.E. Gattiker, W. Haensch, B.L. Ji, S.R. Nassif, E.J. Nowak, D.J. Pearson, N.J. Rohrer, High-performance CMOS variability in the 65-nm regime and beyond. IBM J. Res. Dev. 50(4.5), 433–449 (2006)

    Article  Google Scholar 

  4. A. Islam, M. Hasan, T. Iqbal, M.A. Kafeel, Variability analysis of MTJ-based circuit, in IEEE 3rd International Conference on Computer and Communication Technology (ICCCT), pp. 57–62 (2012)

    Google Scholar 

  5. S.G. Alie, T.A. Chandel, J.R. Dar, Power and delay optimized edge triggered D flip-flops for low power microcontroller. Int. J. Sci. Res. Publ. 4(5) (2014)

    Google Scholar 

  6. Q. Wang, S. Vrudhula, Static power optimization of deep sub-micron CMOS circuits for dual VT technology

    Google Scholar 

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Correspondence to Srabani Das (Roy) .

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Das (Roy), S., Panda, S., Chakraborty, G. (2020). Comparative Analysis of 6-T SRAM Cell in Terms of Power Using CMOS and DGMOS. In: Maharatna, K., Kanjilal, M., Konar, S., Nandi, S., Das, K. (eds) Computational Advancement in Communication Circuits and Systems. Lecture Notes in Electrical Engineering, vol 575. Springer, Singapore. https://doi.org/10.1007/978-981-13-8687-9_25

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  • DOI: https://doi.org/10.1007/978-981-13-8687-9_25

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  • Publisher Name: Springer, Singapore

  • Print ISBN: 978-981-13-8686-2

  • Online ISBN: 978-981-13-8687-9

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