Abstract
Recently, high quality large-area mono- to few-layer 2D h-BN films were synthesized on a variety of transition metals such as Cu, Ni and Pt substrates by CVD using AB as the precursor (Song et al. in Nano Lett 10(8):3209–3215, 2010 [1], Shi et al. in Nano Lett 10(10):4134–4139, 2010 [2], Kim et al. in Nano Lett 13(4):1834–1839, 2013 [3], Kim et al. in Nano Lett 12(1), 161–166, 2012 [4]). This CVD approach thus opens up a potentially industry acceptable technique as it adopts a similar paradigm to large-area thin film deposition methodology.
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References
L. Song, L. Ci, H. Lu, P.B. Sorokin, C. Jin, J. Ni, A.G. Kvashnin, D.G. Kvashnin, J. Lou, B.I. Yakobson, P.M. Ajayan, Nano Lett. 10(8), 3209–3215 (2010)
Y. Shi, C. Hamsen, X. Jia, K.K. Kim, A. Reina, M. Hofmann, A.L. Hsu, K. Zhang, H. Li, Z.-Y. Juang, M.S. Dresselhaus, L.-J. Li, J. Kong, Nano Lett. 10(10), 4134–4139 (2010)
G. Kim, A.R. Jang, H.Y. Jeong, Z. Lee, D.J. Kang, H.S. Shin, Nano Lett. 13(4), 1834–1839 (2013)
K.K. Kim, A. Hsu, X. Jia, S.M. Kim, Y. Shi, M. Hofmann, D. Nezich, J.F. Rodriguez-Nieva, M. Dresselhaus, T. Palacios, J. Kong, Nano Lett. 12(1), 161–166 (2012)
M.S. Bresnehan, M.J. Hollander, M. Wetherington, K. Wang, T. Miyagi, G. Pastir, D.W. Snyder, J.J. Gengler, A.A. Voevodin, W.C. Mitchel, J.A. Robinson, J. Mater. Res. 29(3), 459–471 (2014)
P.-Y. Teng, C.-C. Lu, K. Akiyama-Hasegawa, Y.-C. Lin, C.-H. Yeh, K. Suenaga, P.-W. Chiu, Nano Lett. 12(3), 1379–1384 (2012)
H. Kim, I. Song, C. Park, M. Son, M. Hong, Y. Kim, J.S. Kim, H.-J. Shin, J. Baik, H.C. Choi, ACS Nano 7(8), 6575–6582 (2013)
F. Baitalow, G. Wolf, J.P.E. Grolier, F. Dan, S.L. Randzio, Thermochim. Acta 445(2), 121–125 (2006)
J. Baumann, F. Baitalow, G. Wolf, Thermochim. Acta 430(1–2), 9–14 (2005)
D.-P. Kim, K.-T. Moon, J.-G. Kho, J. Economy, C. Gervais, F. Babonneau, Polym. Adv. Technol. 10(12), 702–712 (1999)
S. Frueh, R. Kellett, C. Mallery, T. Molter, W.S. Willis, C. King’ondu, S.L. Suib, Inorg. Chem. 50(3), 783–792 (2010)
J. Nylén, T. Sato, E. Soignard, J.L. Yarger, E. Stoyanov, U. Häussermann, J. Chem. Phys. 131(10), 104506–104507 (2009)
K.J. Laidler, J. Chem. Educ. 61(6), 494–498 (1984)
L. Wang, B. Wu, J. Chen, H. Liu, P. Hu, Y. Liu, Adv. Mater. 26(10), 1559–1564 (2014)
A. Lipp, K.A. Schwetz, K. Hunold, J. Eur. Ceram. Soc. 5(1), 3–9 (1989)
R. Trehan, Y. Lifshitz, J.W. Rabalais, J. Vac. Sci. Technol. A 8(6), 4026–4032 (1990)
K.K. Kim, A. Hsu, X. Jia, S.M. Kim, Y. Shi, M. Hofmann, D. Nezich, J.F. Rodriguez-Nieva, M. Dresselhaus, T. Palacios, J. Kong, Nano Lett. 12(1), 161–166 (2012)
R.V. Gorbachev, I. Riaz, R.R. Nair, R. Jalil, L. Britnell, B.D. Belle, E.W. Hill, K.S. Novoselov, K. Watanabe, T. Taniguchi, A.K. Geim, P. Blake, Small 7(4), 465–468 (2011)
P.G. Spizzirri, J.-H. Fang, S. Rubanov, E. Gauja, S. Prawer. arXiv:1002.2692v1 (2010)
R.Y. Tay, M.H. Griep, G. Mallick, S.H. Tsang, R.S. Singh, T. Tumlin, E.H.T. Teo, S.P. Karna, Nano Lett. 14(2), 839–846 (2014)
R.J. Nemanich, S.A. Solin, R.M. Martin, Phys. Rev. B 23(12), 6348–6356 (1981)
D.M. Hoffman, G.L. Doll, P.C. Eklund, Phys. Rev. B 30(10), 6051–6056 (1984)
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Tay, R.Y. (2018). Growth of Nanocrystalline Boron Nitride Films on Dielectric Substrates. In: Chemical Vapor Deposition Growth and Characterization of Two-Dimensional Hexagonal Boron Nitride. Springer Theses. Springer, Singapore. https://doi.org/10.1007/978-981-10-8809-4_4
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