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Improved Gate Modulation in Tunnel Field Effect Transistors with Non-rectangular Tapered Y-Gate Geometry

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VLSI Design and Test (VDAT 2017)

Part of the book series: Communications in Computer and Information Science ((CCIS,volume 711))

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Abstract

In this work, a novel approach has been investigated to overcome one of the major issue faced by Tunnel FETs i.e. its low drive current or On-current. The approach employed in the present work makes use of a non-rectangular tapered gate electrode geometry which helps in concentrating the electric field lines emanating from gate electrode towards the source/channel tunneling junction which results in enhancement in the band-to-band tunneling current.

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Acknowledgment

Authors would like to thank Council of Scientific & Industrial Research (CSIR), India (File No. 22(0724)/17/EMR-II)

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Correspondence to Manoj Saxena .

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Narang, R., Gupta, M., Saxena, M. (2017). Improved Gate Modulation in Tunnel Field Effect Transistors with Non-rectangular Tapered Y-Gate Geometry. In: Kaushik, B., Dasgupta, S., Singh, V. (eds) VLSI Design and Test. VDAT 2017. Communications in Computer and Information Science, vol 711. Springer, Singapore. https://doi.org/10.1007/978-981-10-7470-7_46

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  • DOI: https://doi.org/10.1007/978-981-10-7470-7_46

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  • Publisher Name: Springer, Singapore

  • Print ISBN: 978-981-10-7469-1

  • Online ISBN: 978-981-10-7470-7

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