Abstract
If we irradiate an electron beam onto a semiconductor, electrons and holes are generated within the volume where e-beam reaches. The generated carriers undergo diffusion and recombination to reach a new equilibrium. If there exists an electric field such as Schottky contact or p-n junction, the excess electrons and holes are collected by this field.
References
Leamy, H.J.: Charge collection scanning electron microscopy. J. App. Phys. 53, R51–R80 (1982)
Sekiguchi, T., Sumino, K.: Quantitative electron beam tester for defects in semiconductors (CL/EBIC/SDLTS System). Rev. Sci. Instrum. 66, 4277–4282 (1995)
Chen, J., Yuan, X.L., Sekiguchi, T.: Advanced semiconductor diagnosis by multidimensional electron-beam-induced current technique. Scanning 30, 347–353 (2008)
Kittler, M., Seifert, W., Higgs, V.: Recombination activity of misfit dislocations in silicon. Phys. Stat. Sol. a 137, 327–335 (1993)
Kusanagi, S., Sekiguchi, T., Shen, B., Sumino, K.: Electrical activity of extended defects and gettering of metallic impurities in silicon. Mater. Sci. Technol. 11, 685–690 (1995)
Sekiguchi, T., Shen, B., Watanabe, T., Sumino, K.: EBIC study on the electrical activity of stacking faults in silicon. Mater. Sci. Eng., B 42, 235–239 (1996)
Chen, B., Chen, J., Sekiguchi, T., Ohyanagi, T., Matsuhata, H., Kinoshita, A., Okumura, H., Fabbri, F.: Electron-beam-induced current study of stacking faults and partial dislocations in 4H-SiC Schottky diode. Appl. Phys. Lett. 93, 033514/1–033514/3 (2008)
Wang, Z.J., Tsurekawa, S., Ikeda, K., Sekiguchi, T., Watanabe, T.: Relationship between electrical activity and grain boundary structural configuration in polycrystalline silicon. Interface Sci. 7, 197–205 (1999)
Yuan, X.L., Sekiguchi, T., Ri, S.G., Ito, S.: Detection of misfit dislocations at interface of strained Si/Si0.8Ge0.2 by electron-beam-induced current technique. Appl. Phys. Lett. 84, 3316–3318 (2004)
Shockley, W., Read, W.T.: statistics of the recombinations of holes and electrons. Phys. Rev. 87, 835–842 (1952)
Chen, J., Sekiguchi, T.: Carrier recombination activity and structural properties of small-angle grain boundaries in multicrystalline silicon. Jpn. J. Appl. Phys. 46, 6489–6497 (2007)
Chen, J., Sekiguchi, T., Fukata, N., Takase, M., Chikyo, T., Yamabe, K., Hasunuma, R., Akasaka, Y., Inumiya, S., Nara, Y., Yamada, K.: Observation of leakage sites in a hafnium silicon oxynitride gate dielectric of a MOSFET device by electron-beam-induced current. Appl. Phys. Lett. 89, 222104/1–222104/3 (2006)
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Chen, J., Sekiguchi, T. (2018). Electron-Beam-Induced Current. In: The Surface Science Society of Japan (eds) Compendium of Surface and Interface Analysis. Springer, Singapore. https://doi.org/10.1007/978-981-10-6156-1_26
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DOI: https://doi.org/10.1007/978-981-10-6156-1_26
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