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Peculiarities of Formation and Characterization of SiO2/Si Ion-Track Template

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Fundamental and Applied Nano-Electromagnetics II

Abstract

A simple way of forming porous templates of silicon dioxide using ion-track technology was demonstrated. Investigations of the dependence of the characteristics, both of a single pore and of the entire template on the etching time and concentration of etchant were carried out. The possibility of high-precision control of the parameters of porous templates through the post-processing of SEM images in the ImageJ software was demonstrated. An express method for estimating template parameters using ellipsometry was proposed.

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Acknowledgements

The authors acknowledge the support of the work in frames of H2020 – MSCA – RISE2017 – 778308 – SPINMULTIFILM Project, the Scientific-technical program ‘Technology-SG’ [project number 3.1.5.1], and Belarusian Foundation for Basic Research [project number Ф17М-005].

Author information

Authors and Affiliations

  1. Scientific-Practical Materials Research Centre, NAS of Belarus, Minsk, Belarus

    Egor Kaniukov, Victoria Bundyukova, Maksim Kutuzau & Dzmitry Yakimchuk

  2. Institute of Chemistry of New Materials, NAS of Belarus, Minsk, Belarus

    Egor Kaniukov

Authors
  1. Egor Kaniukov
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  2. Victoria Bundyukova
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  3. Maksim Kutuzau
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  4. Dzmitry Yakimchuk
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Corresponding author

Correspondence to Egor Kaniukov .

Editor information

Editors and Affiliations

  1. Department of Electrical and Information Engineering, University of Cassino and Southern Lazio, Cassino, Italy

    Antonio Maffucci

  2. Institute for Nuclear Problems, Belarusian State University, Minsk, Belarus

    Sergey A. Maksimenko

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Kaniukov, E., Bundyukova, V., Kutuzau, M., Yakimchuk, D. (2019). Peculiarities of Formation and Characterization of SiO2/Si Ion-Track Template. In: Maffucci, A., Maksimenko, S. (eds) Fundamental and Applied Nano-Electromagnetics II. NATO Science for Peace and Security Series B: Physics and Biophysics. Springer, Dordrecht. https://doi.org/10.1007/978-94-024-1687-9_3

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