Abstract
It is extremely important to characterize bare copper surfaces in situ before any subsequent corrosion or deposition chemistry on these materials can be understood. In this paper, in situ Atomic Force Microscopy (AFM) was used to image the low-index faces of Cu single crystals in H2SO4 and HC1O4 acidic solutions. Oxide monolayers were observed on Cu(100) and Cu(110) crystals in the thermodynamically forbidden region of the pH-potential phase diagram, which indicates that stable oxide adlayers develop prior to bulk oxide formation. The AFM was also used to follow the electrodeposition of Cu. The AFM is shown to locally enhance the electrochemical deposition of Cu on single crystal Cu surfaces. The tip-sample interaction increases the growth rate of Cu resulting in the localized formation of nanometer-scale epitaxial deposits. The results are consistent with a heterogeneous nucleation and growth mechanism in which the tip-sample interaction creates surface defect sites active towards the electrochemical adsorption of Cu species. Precise control of feature sizes allows this technique to be used for fabrication and constructive modification of solid-liquid interfaces.
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LaGraff, J.R., Gewirth, A.A. (1995). AFM Studies of Copper Solid-Liquid Interfaces. In: Gewirth, A.A., Siegenthaler, H. (eds) Nanoscale Probes of the Solid/Liquid Interface. NATO ASI Series, vol 288. Springer, Dordrecht. https://doi.org/10.1007/978-94-015-8435-7_6
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DOI: https://doi.org/10.1007/978-94-015-8435-7_6
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