Abstract
Electrochemical and in situ STM studies of underpotential deposition (UPD) and overpotential deposition (OPD) of metals in the systems Ag(hkl)/Pb2+ and Au(hkl)/Ag+ are reviewed. The results are discussed on an atomic level with respect to the mechanism of metal deposition. It is shown that the 2-D UPD adlayers act as precursors for the subsequent OPD process determining the epitaxy and the nucleation and growth mechanism of the 3-D metal bulk phase. Investigations in the multicomponent systems Ag(hkl)/Pb2+, Tl+ and Au(hkl)/Ag+, Pb2+, Tl+ demonstrate the formation of different heterostructured ultra-thin films by LIPD and OPD of metals.
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Staikov, G., Lorenz, W.J. (1995). Electrochemical and in situ STM Studies of UPD and OPD of Metals in Different Model Systems. In: Gewirth, A.A., Siegenthaler, H. (eds) Nanoscale Probes of the Solid/Liquid Interface. NATO ASI Series, vol 288. Springer, Dordrecht. https://doi.org/10.1007/978-94-015-8435-7_13
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DOI: https://doi.org/10.1007/978-94-015-8435-7_13
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