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Surface Imaging for EB-Nanolithography

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NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies

Part of the book series: NATO ASI Series ((NSSE,volume 264))

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Abstract

A combination of Surface Imaging resist with a Low Voltage EBL is suggested and it is referred to a suitable EBL-equipment

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Author information

Authors and Affiliations

  1. Institut für Halbleiterphysik Frankfurt (Oder) GmbH, Walter-Korsing-Str. 2, PF 409 O-1200, Frankfurt (Oder), Germany

    M. Böttcher, L. Bauch, A. Wolff & W. Höppner

Authors
  1. M. Böttcher
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  2. L. Bauch
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  3. A. Wolff
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  4. W. Höppner
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Editor information

Editors and Affiliations

  1. CNR-Instituto di Elettronica dello Stato Solido, Roma, Italy

    M. Gentili

  2. Dipartimento di Fisica, Università di Roma “Tor Vergata”, Roma, Italy

    C. Giovannella

  3. CNR-Instituto di Struttura della Materia, Frascati, Roma, Italy

    S. Selci

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© 1994 Springer Science+Business Media Dordrecht

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Böttcher, M., Bauch, L., Wolff, A., Höppner, W. (1994). Surface Imaging for EB-Nanolithography. In: Gentili, M., Giovannella, C., Selci, S. (eds) NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies. NATO ASI Series, vol 264. Springer, Dordrecht. https://doi.org/10.1007/978-94-015-8261-2_6

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  • DOI: https://doi.org/10.1007/978-94-015-8261-2_6

  • Publisher Name: Springer, Dordrecht

  • Print ISBN: 978-90-481-4388-7

  • Online ISBN: 978-94-015-8261-2

  • eBook Packages: Springer Book Archive

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