Skip to main content

Miniaturisation of Gas Sensor Substrate. Problems and Benefits of Microelectronic Technology

  • Chapter
  • 396 Accesses

Part of the book series: NATO ASI Series ((NSSE,volume 212))

Abstract

Microelectronic technology enables miniaturized sensors compatible (or even integrated) with electronics and at reduced cost. The main production steps will be explained, problems are discussed especially those due to the high operating temperature of gas (and odour) sensors of at least 300 °C and solutions are given. A thorough analysis shows that miniaturisation may reduce heating power but that there exist technological and material restraints, like layer thickness and current density in the heater, which prevent further size reduction. The feasibility is proven by a substrate made in microelectronic technology developed for a tin oxide thin film gas sensor but may be used for other sensors too. The sensitive area (a multilayer arrangement of NiFe-heater, insulation, Au-electrodes and gas sensitive SnOx film) is placed in the centre of a thin (10 μm) membrane of silicon oxynitride supported by an outer silicon frame. The whole chip measures 2.7 by 2.7 mm2. Power consumption at the operating temperature of 300 °C amounts to only 75 mW.

This is a preview of subscription content, log in via an institution.

Buying options

Chapter
USD   29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD   169.00
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
USD   219.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info
Hardcover Book
USD   219.99
Price excludes VAT (USA)
  • Durable hardcover edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Learn about institutional subscriptions

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. S. M. Sze (ed.), VLSI Technology, McGraw-Hill, New York, 2nd edn., 1988.

    Google Scholar 

  2. A. Grisel and F. Rudolf, Microsenseurs de gaz sur silicium, Bul. SEV/VSE 7, 5, 9. Mar. 1985, pp. 281-284.

    Google Scholar 

  3. S-C. Chang and D. B. Hicks, Tin oxide microsensors on thin silicon membranes, IEEE Solid State Sensor Workshop, Hilton Head, 1986.

    Google Scholar 

  4. V. Demarne and A. Grisel, An integrated low-power thin-film CO gas sensor on silicon, Sensors and Actuators, 13 (1988) 301–313.

    Article  Google Scholar 

  5. V. Demarne, A. Grisel and R. Sanjines, Comparison of the thermomechanical behaviour and power consumption between different integrated thin film gas sensor structures, Tech. Digest, 4th Int. Conf. on Solid State Sensors and Actuators, Institution of Electrical Engineering of Japan, Tokyo, 1987, pp.605-609.

    Google Scholar 

  6. U. Dibbern, A substrate for thin-film gas sensors in microelectronic technology, Sensors and Actuators B, 2 (1990) 63–70.

    Article  Google Scholar 

  7. S. B. Crary, Thermal management of integrated microsensors, Sensors and Actuators, 12 (1987) 303–312.

    Article  Google Scholar 

  8. F. M. d’Heurle and P. S. Ho, in J. M. K. Poate, N. Tu and J. W. Mayer (eds.), Thin films — interdiffusion and reactions, John Wiley & Sons, New York, 1978, pp. 243–303.

    Google Scholar 

  9. M. J. Rand and J. F. Roberts, Silicon oxynitride films from the NO-NH3-SiH4 reaction, J. Electrochem. Soc., 120 (1973) 446–453.

    Article  Google Scholar 

  10. W. A. P. Claassen, H. A. J. Th. v. d. Pol, A. H. Goemans and A. E. T. Kuiper, Characterization of silicon-oxynitride films deposited by plasma-enhanced CVD, J. Electrochem. Soc., 133 (1986) 1458–1464.

    Article  Google Scholar 

  11. F. Völklein, Thermal conductivity and diffusivity of a thin film SiO2-Si3N4 sandwich system, Thin Solid Films, 188 (1990) 27–33.

    Article  Google Scholar 

  12. S. Bouwstra, R. Legtenberg and Th. J. A. Popma, Silicon-rich LPCVD nitride films for micro-mechanical structures, Proc. Eurosensors II, Enschede, The Netherlands, Nov. 1988.

    Google Scholar 

  13. E. P. Eernisse, Stress in ion-omplanted CVD Si3N4 films, J. Appl. Phys., 48 (1977) 3337–3341.

    Article  Google Scholar 

  14. K. Y. Ahn, M. Wittmer and C. Y. Ting, Investigation of TiN films reactively sputtered using a sputter gun, Thin Solid Films, 107 (1983) 45–54.

    Article  Google Scholar 

  15. T. P. Chow and A. J. Steckel, Refractory metal silicides: thin-film properties and processing technology, IEEE Trans. Electron Dev., ED-30 (1983) 1480–1497.

    Article  Google Scholar 

  16. A. Gangulee, C. H. Bajorek, F. M. d’Heurle and A. F. Mayadas, Long term stability of magnetoresistive bubble detectors, IEEE Trans. Magnetics, MAG-10 (1974) 848–851.

    Article  Google Scholar 

  17. K. E. Bean, Anisotropic etching of silicon, IEEE Trans. Electron Dev. ED-25 (1978) 1185-1193.

    Google Scholar 

  18. M. Hirata, K. Suzuki and H. Tanigawa, Silicon diaphragm pressure sensors fabricated by anodic oxidation etchstop, Sensors and Actuators, 13 (1988) 63–70.

    Article  Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Editor information

Editors and Affiliations

Rights and permissions

Reprints and permissions

Copyright information

© 1992 Springer Science+Business Media Dordrecht

About this chapter

Cite this chapter

Dibbern, U. (1992). Miniaturisation of Gas Sensor Substrate. Problems and Benefits of Microelectronic Technology. In: Gardner, J.W., Bartlett, P.N. (eds) Sensors and Sensory Systems for an Electronic Nose. NATO ASI Series, vol 212. Springer, Dordrecht. https://doi.org/10.1007/978-94-015-7985-8_10

Download citation

  • DOI: https://doi.org/10.1007/978-94-015-7985-8_10

  • Publisher Name: Springer, Dordrecht

  • Print ISBN: 978-90-481-4150-0

  • Online ISBN: 978-94-015-7985-8

  • eBook Packages: Springer Book Archive

Publish with us

Policies and ethics