Abstract
The evolution of the structural and electrically active defects during SOI fabrication by the Smart-Cut technology was investigated. The important roles of hydrogen and boron concentrations in the defects observed in the top layer of SOI structures are shown.
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Popov, V.P. et al. (2000). Structural and Electrical Properties of Silicon on Isolator Structures Manufactured on FZ- and CZ-Silicon by Smart-Cut Technology. In: Hemment, P.L.F., Lysenko, V.S., Nazarov, A.N. (eds) Perspectives, Science and Technologies for Novel Silicon on Insulator Devices. NATO Science Series, vol 73. Springer, Dordrecht. https://doi.org/10.1007/978-94-011-4261-8_4
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DOI: https://doi.org/10.1007/978-94-011-4261-8_4
Publisher Name: Springer, Dordrecht
Print ISBN: 978-0-7923-6117-6
Online ISBN: 978-94-011-4261-8
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