Abstract
Ion implantation has played a central role in the development of Si technology. Here we review some recent trends in machine and materials research for semiconductor and optical devices.
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© 1992 Springer Science+Business Media Dordrecht
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Poate, J.M., Jacobson, D.C., Eaglesham, D.J. (1992). Trends in Ion Implantation for Semiconductor and Optical Materials Research. In: Coffa, S., Priolo, F., Rimini, E., Poate, J.M. (eds) Crucial Issues in Semiconductor Materials and Processing Technologies. NATO ASI Series, vol 222. Springer, Dordrecht. https://doi.org/10.1007/978-94-011-2714-1_18
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DOI: https://doi.org/10.1007/978-94-011-2714-1_18
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