Abstract
TiBN and HfBN films of varying composition have been deposited by co-sputtering from a Ti and Hf target, respectivley, and a BN target with and without applied substrate bias voltage. The chemical compostions were determined by ESCA spectroscopy, the crystal structure by glancing angle x-ray diffraction and hardness and Young’s Modulus by a nanoindenter. Highest hardness values of up to 60 GPa were obtained for films of composition TiB1.5N0.45 and HfB0.85N0.3 The grain size of these films was found to be of about 3 nm.
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Friesen, T., Haupt, J., Gibson, P.N., Gissler, W. (1993). Hardness and Young’s Modulus of Cosputtered Ti-B-N and Hf-B-N Films and Correlations to their Microstructure and Composition. In: Nastasi, M., Parkin, D.M., Gleiter, H. (eds) Mechanical Properties and Deformation Behavior of Materials Having Ultra-Fine Microstructures. NATO ASI Series, vol 233. Springer, Dordrecht. https://doi.org/10.1007/978-94-011-1765-4_32
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DOI: https://doi.org/10.1007/978-94-011-1765-4_32
Publisher Name: Springer, Dordrecht
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