Abstract
This paper summarizes studies undertaken to elucidate the intrinsic oxidation behavior of silicon nitride, both by itself, and in relationship to the other key silicon-based ceramic, silicon carbide. Results presented here include oxidation rates, and some effects related to the formation of a compositionally graded suboxide interlayer during the oxidation of silicon nitride. A unique, noninterfacial oxidation mechanism is shown to account for those effects.
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© 1994 Springer Science+Business Media New York
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Ogbuji, L.U. (1994). The Oxidation Process in Silicon Nitride. In: Nickel, K.G. (eds) Corrosion of Advanced Ceramics. NATO Science Series E: (closed), vol 267. Springer, Dordrecht. https://doi.org/10.1007/978-94-011-1182-9_9
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DOI: https://doi.org/10.1007/978-94-011-1182-9_9
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