Abstract
We have developed a new lithographic patterning technique with the STM, which allows to pattern thin evaporated Au films at the nanometer scale. The STM tip is used to expose a very thin layer of ω-tricosenoic acid, which has been deposited on top of the Au films using the Langmuir-Blodgett technique and acts as an electron sensitive, negative resist. We have fabricated narrow Au lines with a width down to 15 nm and we have checked that our STM lithography does not degrade the metallic properties of the Au films. We have also performed detailed four-terminal magnetoconductance measurements of Au lines which interconnect large contact pads. These measurements confirm the presence of pronounced quantum interference effects in our mesoscopic, quasi one-dimensional fineline structures.
This is a preview of subscription content, log in via an institution to check access.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
Eigler, D.M. and Schweizer, E.K. (1990) Positioning single atoms with a scanning tunneling microscope, Nature 344, 524–526.
McCord, M.A. and Pease, R.F.W. (1988) Lift-off metallization using poly (methyl methacrylate) exposed with a scanning tunneling microscope, J. Vac. Sci. Technol. B 6, 293–296.
Dobisz, E.A. and Marrian, C.R.K. (1991) Sub-30 nm lithography in a negative electron beam resist with a vacuum scanning tunneling microscope, Appl. Phys. Lett. 58, 2526–2528.
Stockman, L., Neuttiens, G., Van Haesendonck, C. and Bruynseraede, Y. (1993) Submicrometer lithographic patterning of thin gold films with a scanning tunneling microscope, Appl. Phys. Lett. 62, 2935–2937.
Stockman, L., Vloeberghs, H., Heyvaert, I., Van Haesendonck, C. and Bruynseraede, Y. (1992) Topographic study of thin gold films grown in SiO2, Ultramicroscopy 42–44, 1317–1320.
Barraud, A., Rosilio, C. and Ruaudel-Teixier, A. (1979) Monomolecular resists: a new class of high resolution resists for electron beam lithography, Solid State Technology 22, 120–124.
Chandrasekhar, V. , Santhanam, P. and Prober, D.E. (1991) Weak localization and conductance fluctuations in complex mesoscopic geometries, Phys. Rev. B 44, 11203–11220.
Lee, P.A. and Stone, A.D. (1985) Universal conductance fluctuations in metals, Phys. Rev. Lett. 55, 1622–1625.
Langer, L., Stockman, L., Heremans J.P., Bayot, V., Olk, C.H., Van Haesendonck, C., Bruynseraede, Y. and Issi, J.-P. (in press) Electrical resistance of a carbon nanotube bundle, J. Mater. Res. 9 (4).
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 1995 Springer Science+Business Media Dordrecht
About this chapter
Cite this chapter
Van Haesendonck, C., Stockman, L., Neuttiens, G., Bruynseraede, Y. (1995). Fabrication of Nanoscale Gold Contacts with the STM: Possible Applications. In: Welland, M.E., Gimzewski, J.K. (eds) Ultimate Limits of Fabrication and Measurement. NATO ASI Series, vol 292. Springer, Dordrecht. https://doi.org/10.1007/978-94-011-0041-0_21
Download citation
DOI: https://doi.org/10.1007/978-94-011-0041-0_21
Publisher Name: Springer, Dordrecht
Print ISBN: 978-94-010-4023-5
Online ISBN: 978-94-011-0041-0
eBook Packages: Springer Book Archive