Abstract
Silica has been finding wide use for a long time owing to its unique mechanical, optical and thermal characteristics. However, only in the last few decades silica-based glasses became an attractive object for extensive fundamental research. There are several reasons to explain the growing interest in silica. One of them is due to the fact that purity of silica has been dramatically improved by orders of magnitude to meet the requirement of fiber-optic telecommunications. Optical loss in modern telecom silica fibers does not exceed 0.2 dB/km at the wavelength of 1.55 micrometers. Such a loss level is achievable in the so-called telecom spectral window, in which a compromise between the absorption tail of the infrared fundamental vibration of O-Si-0 and Rayleigh scattering takes place.
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Golant, K.M. (2000). BULK SILICAS PREPARED BY LOW PRESSURE PLASMA CVD: FORMATION OF STRUCTURE AND POINT DEFECTS. In: Pacchioni, G., Skuja, L., Griscom, D.L. (eds) Defects in SiO2 and Related Dielectrics: Science and Technology. NATO Science Series, vol 2. Springer, Dordrecht. https://doi.org/10.1007/978-94-010-0944-7_15
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DOI: https://doi.org/10.1007/978-94-010-0944-7_15
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