Abstract
GaN and related compounds are wide bandgap semiconductor materials with great potential for optoelectronic applications from blue to ultraviolet wavelengths, and high-power, high-temperature devices. GaN can be crystallized in either hexagonal (wurtzite) or cubic (zincblende) structure depending on the substrate symmetry and growth conditions. In certain cases both structures may co-exist because of the small difference in energy of formation. High-quality wurtzitic GaN has been grown successfully on a variety of substrates, in particular on the basal plane of sapphires. However, cubic structures possess in principle superior electronic properties i.e. doping efficiency and high-speed transport and allow easy cleaving, as necessary for devices such as lasers [1], [2]. Although the traditional substrate used for nitride material growth is sapphire, it is consequently desirable to explore the possibility of using substrates such as silicon or GaAs. In addition to allowing cubic material growth, this could lead to reduction of interfacial defects and impurities as well as, integration of GaN with Si or GaAs-based devices.
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References
J. I. Pankrove, Perspective on gallium nitride, MRS Symp. Proc., (Materials Research Society. Symposia Proceedings) 162(1990) 515
K. Das and D.K.Feny, Hot electron microwave conductivity of wide bandgap semiconductors, Solid-State Electron., 19(1976) 851
C.R. Eddy Jr., T.D. Moustakas, J. Scanlon, Growth of gallium nitide thin films by electron cyclotron resonance microwave plasma-assisted molecular beam epitaxy, J.Appl.Phys., 73, 448, 1993
M.A. Khan, J.M. Van Hove, D.T. Olson, S.Krishnankutty, R.M.Kolbas Growth of high optical and electrical quality GaN layers using low pressure metalorganic chemical vapor deposition, Appl. Phys. lett 58, 526, 1991
T.Detchprohm, K. Hiramatsu, N.Sawaki, I. Akasaki The homoepitaxy of GaN by metalorganic vapor phase epitaxy using GaN substrates, J. Crystal Growth 137, 170(1994)
K.Hiramatsu, H. Amano, I. Akasaki, H.Kato, N. Koide and K. Manabe MOVPE growth of GaN on a misoriented sapphire substrate, J.Crystal Growth 107(1991)
C.H. Hong, K. Wang and D. Pavlidis, Epitaxial growth of cubic GaN on (111) GaAs by Metalorganic Chemical Vapor Deposition, Journal of Electronic Materials, Vol. 24, No.4, 1995, pp.213–218
J.N.Kuznia, M.A.Khan, D.T. Olson, R. Kaplan and J. Freitas, Influence of buffer layers in the deposition of high quality single crystal GaN over sappire substrates, J. Appl. Phys., 73, 4700, 1993
C.H. Hong, K. Wang and D. Pavlidis, Epitaxial growth and structural properties of cubic GaN on (100) and (111) GaAf grown by metalorganic chemical vapor deposition, Presented at Int. Symp. Compound Semicond., San Diego, 18–22 September 1994, Inst. Phys. Conf. ser. No 141, Chapter 2, pp. 107–112
LAkasaki, and H.Amano„ High efficiency UV and blue emitting devices prepared by MOPVE and low enegy electron beam irradiation treatment SPIE Vol 1361, 1990
I.Asasaki and H.Amano, Conductivity control of AlGaN fabrication of AlGaN/GaN multi-Heterostructure and their application to UV/blue light emitting devices, Mat.. Res. Soc. Symp., Proc., 1992
I.Akasaki and H.Amano, Widegap column-in nitride semiconductors for UV/blue light emitting devices, J. Electrchem Soc, Vol 141 No.8 2266, 1994
S.Nakamura, M.Senoh and T. Mukai, High-Power InGaN/GaN double -heterostructure violet light emitting diodes, Appl. Phy. letters 62(19) 2390, 1993
H.Amano, N.Watanabe, N.Koide and I.Akasaki, Rome-temperature low-threshhold surface stimulated emission by optical pumping from Al0.1Ga0.9/GaN double Hetereostructure, Jpn Apl. Phys. Vol 32(1993) pp. L1000 1993
K.Tsubouchi, K.Sugai andN.Mikoshiba, High-frequency and low-dispersion characteristics of surface acousitic waves on AIN/AI2O3 Jpn J. Appl Phys. Vol 19, pp. L751, 1980
M.A. Khan, J.N. Kuznia, A.R. Bhattarai and D.T. Olson, Metal semiconductor field effect transistor based on single crustal GaN, Appl. Phys. Letter, 62(15), pp.1787, 1992
S.C. Binari, L.B. Rowland, G. Kelner, W. Kruppa, H.B. Dietrich, K. Doverspike and D. K. Gakill, DC, microwave, and high-temperature characteristics of GaN FET structures, Presented at Int. Symp. Compound Semicond., San Diego, 18–22 September 1994, Inst. Phys. Conf. ser. No 141, Chapter 4, pp.459–462
K. Wang, J. Singh and D. Pavlidis, Theoretical Study of GaN Growth: A Monte Carlo Approach, Journal of Applied Physics, Vol. 76 (6), 15 September 1994, pp.3502–3510
S.Nakamura, M.Senoh and T. Mukai, Highly P-typed Mg-Doped GaN Films Grown with GaN buffer layers, Jpn. J. Appl. Phys. 30, L1708(1991)
C.R.Abernathy, J.D.Mackenzie and S.J.Pearton, W.S. Hobson CCl4 doping GaN grow by metalorganic molecular beam epitaxy. Appl. Phys. Letters, 66, 1969, 1995
B. Gelmont, K.Kim, M.Shur, Monte Carlo simulation of electron transpot in gallium nitride, J. Appl Phys., 74, 1818, 1993
J.S.Foresi, and and T.D. Moustakes, Metal contacts to gallium nitride Appl. Phys. Lett, 62, 2859, 1993
M.E. Lin, Z. ma, F.Y. Huang, Z.F. Fan, L.H. Allena nd H. Morkoç, Low resistance ohmic contacts on wide band-gap GaN, Appl. Phys. Lett., 64, (8), 21 February 1994, pp.1003–1005
R.P. Joshi, A.N.Dharamsi and J. McAdoo Appl. Phys. lett. 64(26), pp.3611, 1994, Simulations for the high-speed response of GaN metal-semiconductor-metal photodetectors
M.C. Benjamin, Chang Wang, R. F. Davis, R.J. Nemanich, Observation of a negative electron affinity for heteroepitaxial A1N on alpha(6H) SiC(000l), Appl.Phys.lett 64(24) p.3288, 1994
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© 1996 Kluwer Academic Publishers
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Pavlidis, D. (1996). GaN and Related Compounds for Wide Bandgap Applications. In: Luryi, S., Xu, J., Zaslavsky, A. (eds) Future Trends in Microelectronics. NATO ASI Series, vol 323. Springer, Dordrecht. https://doi.org/10.1007/978-94-009-1746-0_26
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DOI: https://doi.org/10.1007/978-94-009-1746-0_26
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