Laser Etching and Microelectronic Applications

Abstract

Laser etching involves use of a laser to directly pattern a semiconductor, insulator, or metal. By either scanning a focused beam or illuminating a mask which is optically imaged onto a sample, the laser both defines and etches the desired pattern. Conventional lithographic techniques involve applying a photoresist which is exposed and developed and then separately etching the substrate and finally removing the resist. While there are more steps in conventional lithography, the processes are relatively well understood, widely practiced, and many tools are commercially available. Some laser etching techniques require further process development and only a few industrial grade tools are commercially available at this time.