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Confirmation of the Wavelength Dependence of Silicon Oxidation Induced by Visible Radiation

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Emerging Technologies for In Situ Processing

Part of the book series: NATO ASI Series ((NSSE,volume 139))

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Abstract

We use a novel technique to amplify small increases in the oxidation rate of laser irradiated silicon to successfully isolate a photonic contribution to the reaction induced by cw argon laser radiation. This method presents clear evidence of optical enhancement over the usual thermally induced growth rate.

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Reference

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© 1988 Martinus Nijhoff Publishers

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Boyd, I.W., Micheli, F. (1988). Confirmation of the Wavelength Dependence of Silicon Oxidation Induced by Visible Radiation. In: Ehrlich, D.J., Nguyen, V.T. (eds) Emerging Technologies for In Situ Processing. NATO ASI Series, vol 139. Springer, Dordrecht. https://doi.org/10.1007/978-94-009-1409-4_19

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  • DOI: https://doi.org/10.1007/978-94-009-1409-4_19

  • Publisher Name: Springer, Dordrecht

  • Print ISBN: 978-94-010-7130-7

  • Online ISBN: 978-94-009-1409-4

  • eBook Packages: Springer Book Archive

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