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Ion Projection Lithography

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Emerging Technologies for In Situ Processing

Part of the book series: NATO ASI Series ((NSSE,volume 139))

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Abstract

Ion Projection Lithography (IPL) uses demagnifying ion- optics to project a reduced ion image of an open stencil mask onto a substrate. The basic principles of this lithographic technique and experimental results obtained with a test bench Ion Projection Lithography Machine (IPLM-01) have already been presented [1-3]. This paper adresses new IPLM-01 results and a discussion of the potential of IPL techniques for in situ process ing.

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Author information

Authors and Affiliations

  1. IMS - Ion Microfabrication Systems GmbH, A-1020 Vienna, Austria

    Gerhard Stengl, Hans Loschner & Ernst Hammel

  2. National Nanofabrication Facility, Cornell University, Ithaca, NY 14853, USA

    Edward D. Wolf

  3. SRI International, Menlo Park, CA 94025, USA

    Julius J. Muray

Authors
  1. Gerhard Stengl
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  2. Hans Loschner
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  3. Ernst Hammel
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  4. Edward D. Wolf
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  5. Julius J. Muray
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Editor information

Editors and Affiliations

  1. Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts, USA

    Daniel J. Ehrlich

  2. Physics and Technologies Research Division, CNET-Grenoble, France

    Van Tran Nguyen (Director) (Director)

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© 1988 Martinus Nijhoff Publishers

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Stengl, G., Loschner, H., Hammel, E., Wolf, E.D., Muray, J.J. (1988). Ion Projection Lithography. In: Ehrlich, D.J., Nguyen, V.T. (eds) Emerging Technologies for In Situ Processing. NATO ASI Series, vol 139. Springer, Dordrecht. https://doi.org/10.1007/978-94-009-1409-4_12

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  • DOI: https://doi.org/10.1007/978-94-009-1409-4_12

  • Publisher Name: Springer, Dordrecht

  • Print ISBN: 978-94-010-7130-7

  • Online ISBN: 978-94-009-1409-4

  • eBook Packages: Springer Book Archive

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