On the Formation and Characterization of Microcrystalline Si:H Prepared by RF Magnetron Sputtering

  • G. Kiriakidis
  • S. Logothetides
Part of the NATO ASI Series book series (NSSE, volume 155)

Abstract

Over the last few years, microcrystalline silicon (μc-Si) has attracted increasing attention as a new potential material for thin film device applications such as contact interlayers in solar cells (1–4). preparation of thin films of μc-Si can be achieved via chemical transport in a hydrogen plasma (1) deposition from a glow-dischacge (GD) of silane diluted in hydrogen or inert gas at a higher power level (5)or by reactive-sputtering, (6–8) a technique applied in the present report.

Keywords

Magnetron Sputtering Spectroscopic Ellipsometry Hydrogen Partial Pressure Microcrystalline Silicon Silicon Hydride 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Kluwer Academic Publishers 1989

Authors and Affiliations

  • G. Kiriakidis
    • 1
  • S. Logothetides
    • 2
  1. 1.Research Center of Crete and Physics Departmentuniversity of CreteCreteGreece
  2. 2.First Physics Lab.Univ. of ThessalonikiThessalonikiGreece

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