On the Formation and Characterization of Microcrystalline Si:H Prepared by RF Magnetron Sputtering

  • G. Kiriakidis
  • S. Logothetides
Part of the NATO ASI Series book series (NSSE, volume 155)


Over the last few years, microcrystalline silicon (μc-Si) has attracted increasing attention as a new potential material for thin film device applications such as contact interlayers in solar cells (1–4). preparation of thin films of μc-Si can be achieved via chemical transport in a hydrogen plasma (1) deposition from a glow-dischacge (GD) of silane diluted in hydrogen or inert gas at a higher power level (5)or by reactive-sputtering, (6–8) a technique applied in the present report.


Magnetron Sputtering Spectroscopic Ellipsometry Hydrogen Partial Pressure Microcrystalline Silicon Silicon Hydride 
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Copyright information

© Kluwer Academic Publishers 1989

Authors and Affiliations

  • G. Kiriakidis
    • 1
  • S. Logothetides
    • 2
  1. 1.Research Center of Crete and Physics Departmentuniversity of CreteCreteGreece
  2. 2.First Physics Lab.Univ. of ThessalonikiThessalonikiGreece

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