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High-Fluence Implantation in Insulators. Part II: Chemical Changes

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Materials Modification by High-fluence Ion Beams

Part of the book series: NATO ASI Series ((NSSE,volume 155))

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Abstract

The aim of this paper is to review some recent works dealing with chemical modifications induced in inorganic insulators by ion bombardment. Obviously chemical transformations always occur during materials processing with high fluence ion beams. However, in spite of their ubiquity, they have been rarely investigated per se and thus have received much less attention than other types of beam induced modifications such as, for instance, electronic, mechanical or optical ones. The only exception is the improvement of the corrosion resistance of metals and alloys induced by ion implantation, which has been the subject of numerous investigations. As the field of ion-induced chemical modifications is exceedingly vast, the present review does not intend to be exhaustive but will be restricted to a few examples which best illustrate this field from the standpoint of both fundamental research and potential applications. The limitation to inorganic insulators may appear arbitrary, but will be justified below.

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© 1989 Kluwer Academic Publishers

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Dran, JC. (1989). High-Fluence Implantation in Insulators. Part II: Chemical Changes. In: Kelly, R., da Silva, M.F. (eds) Materials Modification by High-fluence Ion Beams. NATO ASI Series, vol 155. Springer, Dordrecht. https://doi.org/10.1007/978-94-009-1267-0_26

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  • DOI: https://doi.org/10.1007/978-94-009-1267-0_26

  • Publisher Name: Springer, Dordrecht

  • Print ISBN: 978-94-010-7063-8

  • Online ISBN: 978-94-009-1267-0

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