Thin Film and Near Surface Characterization Using Indentation Systems

  • D. L. Joslin
  • C. J. McHARGUE
  • W. C. Oliver
Part of the NATO ASI Series book series (NSSE, volume 170)

Abstract

In recent years, thin films and ion implanted layers have been the focus of much research. Such surface layers are used for a variety of applications in industry. For example, thin metallic films are used for electrical contacts and for diffusion barriers in the semiconductor industry. Thin ceramic films are used as optical coatings for light emitting diodes and for optical windows. Thin films are also used to enhance wear resistance, and to provide corrosion protection and lubrication. Ion implanted layers are created in both metals and ceramics to enhance the toughness and wear resistance of such things as medical implants and optical materials. Such layers can also provide corrosion resistance and lubrication.

Keywords

Sapphire Substrate Crystalline Layer Thin Metallic Film Indenter Displacement Constant Displacement Rate 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    Nishibori M, K Kinosita: Thin Solid Films 48 (1978) 325.CrossRefGoogle Scholar
  2. 2.
    Pethica JB, R Hutchings, WC Oliver: Phil. Mag. A 48 (4) (1983) 593.Google Scholar
  3. 3.
    Loubet JL, JM Georges, 0 Marchesini, G Meille: J. Tribology 106 (1984) 43.CrossRefGoogle Scholar
  4. 4.
    Newey D, HM Pollock, MA Wilkins: Ion Implantation into Metals. New York: Pergamon Press, 1982, 157.Google Scholar
  5. 5.
    Doerner MF, WD Nix: J. Mater. Res. 1 (4) (1986) 601.CrossRefGoogle Scholar
  6. 6.
    Oliver, WC, CJ McHargue, GC Farlow, CW White: Defect Properties and Processing of High-Technology Non-Metallic Materials. Y Chen, WD Kingery, RJ Stokes (eds). Pittsburgh: Materials Research Society, 1986, 515.Google Scholar
  7. 7.
    Tsai H-c, DB Bogy: J. Vac. Sci. Technol. A 5 (6) (1987) 3287.CrossRefGoogle Scholar
  8. 8.
    Pethica, JB, P Koidl, J Gobrecht, C. Schiiler: J. Vac. Sci. Technol. A 3 (6) (1985) 2391.Google Scholar
  9. Metals Handbook, 8th ed.(1) Cleveland: American Society for Metals, 1961, 1201.Google Scholar
  10. 10.
    McHargue CJ, MB Lewis, BR Appleton, H Naramoto, CW White, JM Williams: Science of Hard Materials. RK Viswanadham, DJ Rowcliffe, J Gurland (eds). New York: Plenum Publishing Co., 1983, 451.Google Scholar
  11. 11.
    McHargue CJ, CW White, BR Appleton, GC Farlow, JM Williams: Ion Implantation and Ion Beam Processing of Materials. GK Hubler, OW Holland, CR Clayton, CW White (eds). Amsterdam: North-Holland, 1984, 385.Google Scholar
  12. 12.
    Farlow GC, CW White, CJ McHargue, PS Sklad, BR Appleton: Nucl. Inst. Meth. Phys. Res. B 7/8 (1985) 541.CrossRefGoogle Scholar
  13. 13.
    Burnett PJ, TF Page: Plasticity of Ceramic Materials. RC Bradt, RE Tressler (eds). New York: Plenum Publishing Co., 1984, 669.Google Scholar
  14. 14.
    McHargue CJ: Ion Beam Modification of Insulators. P Mazzoldi, G Arnold (eds). Amsterdam: Elsevier Science Publishers, 1987, 223.Google Scholar

Copyright information

© Kluwer Academic Publishers 1989

Authors and Affiliations

  • D. L. Joslin
    • 1
  • C. J. McHARGUE
    • 2
  • W. C. Oliver
    • 2
  1. 1.University of TennesseeKnoxvilleUSA
  2. 2.Oak Ridge National LaboratoryOak RidgeUSA

Personalised recommendations