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Structural, Electrical and Optical Characterization of Sputtered ZnOx Thin Film

  • T. Nishihara
  • N. Fujimura
  • T. Ito

Abstract

As Zinc oxide films have many available characteristics, a large number of crystallographic studies have been reported on the films deposited by sputtering. However, most of those are about the influence of deposition conditions for (002) (c-axis) oriented films(l)–(2). The growing process of ZnOx films has not been necessarily manifested.

Keywords

Substrate Temperature Prefer Orientation Increase Annealing Temperature Osaka Prefecture Indium Antimonide 
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References

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Copyright information

© Elsevier Science Publishers Ltd. 1990

Authors and Affiliations

  • T. Nishihara
    • 1
  • N. Fujimura
    • 2
  • T. Ito
    • 2
  1. 1.University of Osaka PrefectureJapan
  2. 2.Metallurgical Engineering, College of EngineeringUniversity of Osaka PrefectureSakai, OsakaJapan

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