Diffusion: Predeposition

  • George E. Anner


Diffusion is a process used for forming p-n junctions in semiconductor devices. A particular atomic species, having a nonuniform distribution and undergoing random thermal motion, suffers a directed motion by diffusion from regions of higher to lower concentration of that species. It is a highly temperature dependent process.


Silicon Wafer Local Source Boron Nitride Sheet Resistance Furnace Tube 
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Copyright information

© Van Nostrand Reinhold 1990

Authors and Affiliations

  • George E. Anner
    • 1
  1. 1.University of IllinoisChampaign-UrbanaUSA

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