Abstract
The nitrogen-pair oxygen defect in silicon has been studied by infrared absorption spectroscopy on samples implanted with various combinations of 14N, 15N, 160 and 170. The measurements give direct evidence for the involvement of nitrogen and oxygen in the defect and show that the impurity atoms comprising the defect are only weakly coupled. Ab initio cluster calculation on several models of the nitrogen-pair oxygen defect have been performed and are compared with experiment. Based on these investigations a model consisting of a bridging oxygen atom adjacent to the nitrogen pair is suggested.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
Sumino K., Yonenaga I., Imai M. and Abe T. (1983) Effects of nitrogen on dislocation behavior and mechanical strength in silicon crystals, J. Appl. Phys. 54, 5016–5020.
Heggie M. I. H., Jones R. and Umerski A. (1993) Ab Initio Total Energy Calculations of Impurity Pinning in Silicon, Phys. Status Solidi a 138, 383-387.
Stein H. J. (1985) Nitrogen in Crystalline Silicon, in J. C. Mikkelsen, Jr., S. J. Pearton, J. W. Corbett and S. J. Pennycook (eds), Oxygen, Carbon, Hydrogen and Nitrogen in Crystalline Silicon, MRS, Pittsburgh, PA, Vol. 59, pp. 523–535.
Navarro H., Griffin J., Weber J. and Genzel L. (1986) New Oxygen Related Shallow Thermal Donor Centres in Czochralski-grown Silicon, Solid Stat. Commun. 58, 151–155.
Suezawa M., Sumino K., Harada H and Abe T. (1988) The Nature of Nitrogen-Oxygen Complexes in Silicon, Jpn. J. Appl Phys. 27, 62–67.
Hara A., Aoki M., Koizuka M. and Fukuda T (1994) Model for NL10 thermal donors formed in annealed oxygen-rich silicon crystals, J. Appl. Phys. 75, 2929–2935.
Griffin J., Hartung J., Weber J., Navarro H. and Genzel L (1989) Photothermal Ionisation Spectroscopy of Oxygen-Related Shallow Defects in Crystalline Silicon, Appl Phys. A 48, 41–47.
Heijmink Liesert B. J., Gregorkiewicz T. and Ammerlaan C. A. J. (1993) Photoluminescence of silicon thermal donors, Phys. Rev. B 47, 7005–7012.
Martinov Yu. V., Gregorkiewicz T. and Ammerlaan C. A. J. (1995) Role of hydrogen in formation and structure of the Si-NLlO thermal donor, Phys. Rev. Lett. 74, 2030–2033.
Yang D., Que D. L. and Sumino K. (1995) Nitrogen effects on thermal donor and shallow thermal donor in silicon, J. Appl Phys. 77, 943–944 (1995).
Wagner P. and Hage J., (1989) Thermal Double Donors in Silicon, Appl Phys. A 49, 123–138.
Stein H. J. (1985) Oxygen-Nitrogen Interactions in Ion-Implanted Silicon, in Johnson N. M., Bishop S. G. and Watkins G. D. (eds), Microscopic Identification of Electronic Defects in Semiconductors, MRS, Pittsburgh, PA, pp. 287–291.
Jones R., Öberg S, Berg Rasmussen F. and Bech Nielsen B. (1994) Identification of the Dominant Nitrogen Defects in Silicon, Phys. Rev. Lett. 72, 1882–1885.
Wagner P., Oeder R. and Zulehner W. (1988) Nitrogen-Oxygen Complexes in Czochralski-Silicon, Appl. Phys. A 46, 73–76.
Qi M. W., Tan S. S., Zhu B., Cai P. X., Gu W. F. , Xu X. M., Shi T. S. , Que D. L. and Li L. B. (1991) The evidence for interaction of the N-N pair with oxygen in Czochralski silicon, J. Appl. Phys. 69, 3775–3777.
Jones R., Ewels C., Goss J., Miro J., Deák P., Öberg S. and Berg Rasmussen F. (1994) Theoretical and isotopic infrared absorption investigations of nitrogen-oxygen defects in silicon, Semicond. Sci. Technol. 9, 2145–2148.
Newman R. C. (1973) Infrared Studies of Crystal Defects, Taylor and Francis, London.
Umerski A. and Jones R. (1993) The interaction of oxygen with dislocation cores in silicon, Phil. Mag. A 67, 905–915.
Jones R., Umerski A. and Öberg S. (1992) Ab initio calculation of the local vibratory modes of interstitial oxygen in silicon , Phys. Rev. B 45, 11321–11323.
Jones R. (1992) Ab initio cluster calculations of defects in solids, Phil. Trans. R. Soc. Lond. A 341, 351–360.
Deök P., Snyder L. C. and Corbett J. W. (1992) Theoretical studies on the core structure of the 450°C oxygen thermal donor in silicon, Phys. Rev. B 45, 11612–11626.
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 1996 Kluwer Academic Publishers
About this chapter
Cite this chapter
Berg Rasmussen, F. et al. (1996). The Nitrogen-Pair Oxygen Defect in Silicon. In: Jones, R. (eds) Early Stages of Oxygen Precipitation in Silicon. NATO ASI Series, vol 17. Springer, Dordrecht. https://doi.org/10.1007/978-94-009-0355-5_18
Download citation
DOI: https://doi.org/10.1007/978-94-009-0355-5_18
Publisher Name: Springer, Dordrecht
Print ISBN: 978-94-010-6645-7
Online ISBN: 978-94-009-0355-5
eBook Packages: Springer Book Archive