Abstract
We discuss technology strategies for the fabrication of both two and three-dimensional photonic microstructures in semiconductors. The importance of the role of III-V semiconductors in optoelectronics is used to justify research on photonic microstructures based on this class of material. The technology armoury already established in III-V semiconductors is outlined, together with ways in which this armoury could be extended to meet the new challenges of fabricating photonic microstructures. While the greater difficulties of realising three-dimensional structures are emphasized, the opportunities for near-future device developments based on two-dimensional photonic microstructures are also recognised.
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De La Rue, R.M., Krauss, T.F. (1996). Strategies for the Fabrication of Photonic Microstructures in Semiconductors. In: Rarity, J., Weisbuch, C. (eds) Microcavities and Photonic Bandgaps: Physics and Applications. NATO ASI Series, vol 324. Springer, Dordrecht. https://doi.org/10.1007/978-94-009-0313-5_16
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DOI: https://doi.org/10.1007/978-94-009-0313-5_16
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