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Bandgap Engineering of 3-D Photonic Crystals Operating at Optical Wavelengths

  • V. Arbet-Engels
  • E. Yablonovitch
  • C. C. Cheng
  • A. Scherer
Chapter
Part of the NATO ASI Series book series (NSSE, volume 324)

Abstract

We describe the fabrication of three-dimensional photonic crystals with bandgaps lying in the near infrared region of the electromagnetic spectrum. By fabricating these nano-structures using a reproducible and reliable procedure consisting of electron beam lithography followed by dry etching, we have produced up to four-layer deep photonic crystals. The spectral response of these devices was tuned by lithographically controlling their spatial periodicities. In the present work, we discuss the elaborate processing steps used to synthesize these three-dimensional dielectric structures and analyze their transmission spectra in comparison with a macro-machined microwave model.

Keywords

Photonic Crystal Etch Rate Electron Beam Lithography Triangular Array Microwave Spectrum 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Kluwer Academic Publishers 1996

Authors and Affiliations

  • V. Arbet-Engels
    • 1
  • E. Yablonovitch
    • 1
  • C. C. Cheng
    • 2
  • A. Scherer
    • 2
  1. 1.Electrical Engineering DepartmentUniversity of California, Los AngelesLos AngelesUSA
  2. 2.Electrical Engineering DepartmentCalifornia Institute of TechnologyPasadenaUSA

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