Pulsed Laser Deposition of Nb5Te4 Thin Films
Niobium telluride thin films were produced by excimer laser vaporisation of NbTe2 bulk targets and deposition of the ablation plume on heated silicon substrates. Precise control of the laser energy density and of the substrate temperature leads to good quality, well-crystallized thin films. For a specific couple of fluence and temperature, films were crystallized in the Nb5Te4 phase. In order to characterize the influence of laser parameters, analyse of the ablation plume by optical spectroscopy was performed using an Optical Multichanel Analyzer.
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